Inventor

LAIDIG THOMAS L

US38 patents

⚠️ This page may combine multiple inventors who share the name “LAIDIG THOMAS L”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

LAIDIG THOMAS L

APPLIED MATERIALS INC

Half tone scheme for maskless lithography

Image stabilization for digital lithography

Resolution enhanced digital lithography with anti-blazed DMD

Reserving spatial light modulator sections to address field non-uniformities

Half tone scheme for maskless lithography

Method to reduce line waviness

Apparatus and methods for on-the-fly digital exposure image data modification

Method to reduce line waviness

Dynamic generation of layout adaptive packaging

Use of adaptive replacement maps in digital lithography for local cell replacement

Method to reduce line waviness

Controlling light source wavelengths for selectable phase shifts between pixels in digital lithography systems

Dynamic generation of layout adaptive packaging

Dynamic generation of layout adaptive packaging

Controlling light source wavelengths for selectable phase shifts between pixels in digital lithography systems

Dynamic generation of layout adaptive packaging

Half tone scheme for maskless lithography

Freeform distortion correction

Reserving spatial light modulator sections to address field non-uniformities

Line edge roughness reduction via step size alteration

Overlaying on locally dispositioned patterns by ML based dynamic digital corrections (ML-DDC)

Use of adaptive replacement maps in digital lithography for local cell replacement

Overlaying on locally dispositioned patterns by ML based dynamic digital corrections (ML-DDC)

Multi-tone scheme for maskless lithography

Reserving spatial light modulator sections to address field non-uniformities

Shifting of patterns to reduce line waviness

Line edge roughness reduction via step size alteration

Apparatus and methods for on-the-fly digital exposure image data modification

Resolution enhanced digital lithography with anti-blazed DMD

Correction of non-uniform patterns using time-shifted exposures

Active eye-to-eye with alignment by X-Y capacitance measurement

Digital lithography scan sequencing

Method to reduce data stream for spatial light modulator

Data tuning for fast computation and polygonal manipulation simplification

Optimization of a digital pattern file for a digital lithography device

Real time software and array control

MICROUNITY SYSTEMS ENG

Method for generating proximity correction features for a lithographic mask pattern

Optical proximity correction method for intermediate-pitch features using sub-resolution scattering bars on a mask