Inventor
HOLLERBACH UWE
US15 patents
⚠️ This page may combine multiple inventors who share the name “HOLLERBACH UWE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
9 patentsUS10678150B1Jun 9, 2020
Dynamic generation of layout adaptive packaging
APPLIED MATERIALS INC1 citations72
US12372779B2Jul 29, 2025
Controlling light source wavelengths for selectable phase shifts between pixels in digital lithography systems
APPLIED MATERIALS INC0 citations62
US12360467B2Jul 15, 2025
Dynamic generation of layout adaptive packaging
APPLIED MATERIALS INC0 citations62
US11899198B2Feb 13, 2024
Controlling light source wavelengths for selectable phase shifts between pixels in digital lithography systems
APPLIED MATERIALS INC1 citations62
US11899379B2Feb 13, 2024
Dynamic generation of layout adaptive packaging
APPLIED MATERIALS INC0 citations62
US11599032B2Mar 7, 2023
Dynamic generation of layout adaptive packaging
APPLIED MATERIALS INC0 citations62
US12242789B2Mar 4, 2025
Overlaying on locally dispositioned patterns by ML based dynamic digital corrections (ML-DDC)
APPLIED MATERIALS INC0 citations59
US11934762B2Mar 19, 2024
Overlaying on locally dispositioned patterns by ML based dynamic digital corrections (ML-DDC)
APPLIED MATERIALS INC0 citations59
US10331038B2Jun 25, 2019
Real time software and array control
APPLIED MATERIALS INC0 citations36
ASML MASKTOOLS BV
5 patentsUS7175940B2Feb 13, 2007
Method of two dimensional feature model calibration and optimization
ASML MASKTOOLS BV365 citations98
US7376930B2May 20, 2008
Method, program product and apparatus for generating assist features utilizing an image field map
ASML MASKTOOLS BV13 citations84
US7820341B2Oct 26, 2010
Method of two dimensional feature model calibration and optimization
ASML MASKTOOLS BV12 citations83
US7349066B2Mar 25, 2008
Apparatus, method and computer program product for performing a model based optical proximity correction factoring neighbor influence
ASML MASKTOOLS BV9 citations83
US7856606B2Dec 21, 2010
Apparatus, method and program product for suppressing waviness of features to be printed using photolithographic systems
ASML MASKTOOLS BV1 citations47