Inventor
BIELING STIG
DE21 patents
⚠️ This page may combine multiple inventors who share the name “BIELING STIG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT GMBH
17 patentsUS11169445B2Nov 9, 2021
Pupil facet mirror, optical system and illumination optics for a projection lithography system
ZEISS CARL SMT GMBH3 citations73
US10018917B2Jul 10, 2018
Illumination optical unit for EUV projection lithography
ZEISS CARL SMT GMBH3 citations73
US9983484B2May 29, 2018
Illumination optical unit for EUV projection lithography
ZEISS CARL SMT GMBH5 citations73
US9983483B2May 29, 2018
Illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH2 citations73
US9874819B2Jan 23, 2018
Mirror array
ZEISS CARL SMT GMBH4 citations70
US11003086B2May 11, 2021
Illumination optical device for projection lithography
ZEISS CARL SMT GMBH0 citations62
US10599041B2Mar 24, 2020
Facet mirror
ZEISS CARL SMT GMBH1 citations62
US9477157B2Oct 25, 2016
Illumination system of a microlithographic projection exposure apparatus
ZEISS CARL SMT GMBH2 citations62
US12468228B2Nov 11, 2025
Illumination optical system for EUV projection lithography
ZEISS CARL SMT GMBH0 citations58
US10948828B2Mar 16, 2021
Illumination optical element for projection lithography
ZEISS CARL SMT GMBH0 citations52
US9791784B2Oct 17, 2017
Assembly for a projection exposure apparatus for EUV projection lithography
ZEISS CARL SMT GMBH1 citations52
US10324380B2Jun 18, 2019
Projection exposure apparatus and method for measuring an imaging aberration
ZEISS CARL SMT GMBH0 citations51
US10146136B2Dec 4, 2018
Reflecting coating with optimized thickness
ZEISS CARL SMT GMBH1 citations51
US10394129B2Aug 27, 2019
Microlithographic illumination unit
ZEISS CARL SMT GMBH0 citations41
US10133182B2Nov 20, 2018
Illumination optical assembly for a projection exposure apparatus
ZEISS CARL SMT GMBH0 citations41
US8345219B2Jan 1, 2013
Method and apparatus for setting an illumination optical unit
ZEISS CARL SMT GMBH0 citations41
US10409167B2Sep 10, 2019
Method for illuminating an object field of a projection exposure system
ZEISS CARL SMT GMBH0 citations39