Inventor

YANG CHAN-SYUN DAVID

US17 patents

⚠️ This page may combine multiple inventors who share the name “YANG CHAN-SYUN DAVID”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

YANG CHAN-SYUN DAVID

TAIWAN SEMICONDUCTOR MFG CO LTD

Methods for forming wrap around contact

Self-aligned multiple spacer patterning process

Methods for forming wrap around contact

Method and equipment for forming gaps in a material layer

Method of forming semiconductor structure having layer with re-entrant profile

Method and equipment for forming gaps in a material layer

Methods for forming wrap around contact

Semiconductor device and method of manufacture

Semiconductor device and method of manufacture

Air gap spacer and related methods

Method of forming semiconductor structure having layer with re-entrant profile

Semiconductor structure having layer with re-entrant profile and method of forming the same

Wrap around contact

(unassigned)

Method of etching a trench in a silicon-on-insulator (SOI) structure

Method for fabricating an interconnect line

APPLIED MATERIALS INC

Method of forming a notched silicon-containing gate structure

LAM RES CORP

Methods and compositions for post-etch layer stack treatment in semiconductor fabrication