Inventor
SCHULTZ JOERG
DE28 patents
⚠️ This page may combine multiple inventors who share the name “SCHULTZ JOERG”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ZEISS CARL SMT AG
16 patentsUS7511886B2Mar 31, 2009
Optical beam transformation system and illumination system comprising an optical beam transformation system
ZEISS CARL SMT AG63 citations98
US7186983B2Mar 6, 2007
Illumination system particularly for microlithography
ZEISS CARL SMT AG21 citations93
US7583433B2Sep 1, 2009
Multi mirror system for an illumination system
ZEISS CARL SMT AG13 citations92
US6840640B2Jan 11, 2005
Multi mirror system for an illumination system
ZEISS CARL SMT AG18 citations92
US6704095B2Mar 9, 2004
Control of a distribution of illumination in an exit pupil of an EUV illumination system
ZEISS CARL SMT AG18 citations92
US7348565B2Mar 25, 2008
Illumination system particularly for microlithography
ZEISS CARL SMT AG10 citations84
US7329886B2Feb 12, 2008
EUV illumination system having a plurality of light sources for illuminating an optical element
ZEISS CARL SMT AG18 citations83
US7071476B2Jul 4, 2006
Illumination system with a plurality of light sources
ZEISS CARL SMT AG13 citations82
US6680803B2Jan 20, 2004
Partial objective in an illuminating systems
ZEISS CARL SMT AG15 citations82
US7456408B2Nov 25, 2008
Illumination system particularly for microlithography
ZEISS CARL SMT AG6 citations74
US6770894B1Aug 3, 2004
Illumination system with field mirrors for producing uniform scanning energy
ZEISS CARL SMT AG10 citations74
US7551361B2Jun 23, 2009
Lithography lens system and projection exposure system provided with at least one lithography lens system of this type
ZEISS CARL SMT AG7 citations73
US7126137B2Oct 24, 2006
Illumination system with field mirrors for producing uniform scanning energy
ZEISS CARL SMT AG9 citations71
US7592598B2Sep 22, 2009
Illumination system particularly for microlithography
ZEISS CARL SMT AG2 citations63
US7148495B2Dec 12, 2006
Illumination system, particularly for EUV lithography
ZEISS CARL SMT AG2 citations63
US7443948B2Oct 28, 2008
Illumination system particularly for microlithography
ZEISS CARL SMT AG2 citations62
ZEISS STIFTUNG
7 patentsUS6438199B1Aug 20, 2002
Illumination system particularly for microlithography
ZEISS STIFTUNG199 citations99
US6198793B1Mar 6, 2001
Illumination system particularly for EUV lithography
ZEISS STIFTUNG236 citations99
US6507440B1Jan 14, 2003
Components with an anamorphotic effect for reducing an aspect ratio of a raster element in an illumination system
ZEISS STIFTUNG68 citations96
US6400794B1Jun 4, 2002
Illumination system, particularly for EUV lithography
ZEISS STIFTUNG63 citations96
US6570168B1May 27, 2003
Illumination system with a plurality of light sources
ZEISS STIFTUNG55 citations94
US6366410B1Apr 2, 2002
Reticular objective for microlithography-projection exposure installations
ZEISS STIFTUNG33 citations93
US6445442B2Sep 3, 2002
Projection-microlithographic device
ZEISS STIFTUNG14 citations84