Inventor
RINN KLAUS
DE19 patents
⚠️ This page may combine multiple inventors who share the name “RINN KLAUS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
LEICA MICROSYSTEMS
9 patentsUS6008902ADec 28, 1999
Method and device for heterodyne interferometer error correction
LEICA MICROSYSTEMS89 citations95
US6559458B2May 6, 2003
Measuring instrument and method for measuring features on a substrate
LEICA MICROSYSTEMS26 citations92
US6549648B1Apr 15, 2003
Method for determining a position of a structural element on a substrate
LEICA MICROSYSTEMS48 citations92
US6317991B1Nov 20, 2001
Method for correcting measurement errors in a machine measuring co-ordinates
LEICA MICROSYSTEMS55 citations92
US6920249B2Jul 19, 2005
Method and measuring instrument for determining the position of an edge of a pattern element on a substrate
LEICA MICROSYSTEMS50 citations91
US6323953B1Nov 27, 2001
Method and device for measuring structures on a transparent substrate
LEICA MICROSYSTEMS43 citations89
US6924900B2Aug 2, 2005
Method and microscope for detection of a specimen
LEICA MICROSYSTEMS8 citations73
US6825939B2Nov 30, 2004
Method and measuring arrangement for detecting an object
LEICA MICROSYSTEMS2 citations62
US6816263B2Nov 9, 2004
Interferometric measurement apparatus for wavelength calibration
LEICA MICROSYSTEMS4 citations62
VISTEC SEMICONDUCTOR SYS GMBH
7 patentsUS7694426B2Apr 13, 2010
Method for eliminating sources of error in the system correction of a coordinate measuring machine
VISTEC SEMICONDUCTOR SYS GMBH9 citations83
US7548321B2Jun 16, 2009
Method for enhancing the measuring accuracy when determining the coordinates of structures on a substrate
VISTEC SEMICONDUCTOR SYS GMBH10 citations83
US7420670B2Sep 2, 2008
Measuring instrument and method for operating a measuring instrument for optical inspection of an object
VISTEC SEMICONDUCTOR SYS GMBH10 citations83
US7823295B2Nov 2, 2010
Method for calibration of a measuring table of a coordinate measuring machine
VISTEC SEMICONDUCTOR SYS GMBH3 citations62
US7680616B2Mar 16, 2010
Method for correcting an error of the imaging system of a coordinate measuring machine
VISTEC SEMICONDUCTOR SYS GMBH2 citations62
US7654007B2Feb 2, 2010
Method for improving the reproducibility of a coordinate measuring apparatus and its accuracy
VISTEC SEMICONDUCTOR SYS GMBH4 citations61
US7939789B2May 10, 2011
Method for reproducibly determining geometrical and/or optical object characteristics
VISTEC SEMICONDUCTOR SYS GMBH0 citations40