Inventor
MACKEY JEFFREY L
US8 patents
Patents
8 patentsUS7053987B2May 30, 2006
Methods and systems for controlling radiation beam characteristics for microlithographic processing
MICRON TECHNOLOGY INC14 citations92
US7046339B2May 16, 2006
Optimized optical lithography illumination source for use during the manufacture of a semiconductor device
MICRON TECHNOLOGY INC38 citations92
US6894765B2May 17, 2005
Methods and systems for controlling radiation beam characteristics for microlithographic processing
MICRON TECHNOLOGY INC21 citations92
US7538858B2May 26, 2009
Photolithographic systems and methods for producing sub-diffraction-limited features
MICRON TECHNOLOGY INC44 citations91
US7283205B2Oct 16, 2007
Optimized optical lithography illumination source for use during the manufacture of a semiconductor device
MICRON TECHNOLOGY INC12 citations83
US7130022B2Oct 31, 2006
Methods and systems for controlling radiation beam characteristics for microlithographic processing
MICRON TECHNOLOGY INC8 citations73
US7823440B2Nov 2, 2010
Systems and methods for characterizing thickness and topography of microelectronic workpiece layers
MICRON TECHNOLOGY INC0 citations51
US7760329B2Jul 20, 2010
Optimized optical lithography illumination source for use during the manufacture of a semiconductor device
MICRON TECHNOLOGY INC0 citations51