Inventor
BREITSCHWERDT KLAUS
DE12 patents
⚠️ This page may combine multiple inventors who share the name “BREITSCHWERDT KLAUS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
BOSCH GMBH ROBERT
9 patentsUS7149070B2Dec 12, 2006
Holding device, in particular for fixing a semiconductor wafer in a plasma etching device, and method for supplying heat to or dissipating heat from a substrate
BOSCH GMBH ROBERT11 citations83
US7285228B2Oct 23, 2007
Device and method for anisotropic plasma etching of a substrate, a silicon body in particular
BOSCH GMBH ROBERT14 citations81
US7785486B2Aug 31, 2010
Method of etching structures into an etching body using a plasma
BOSCH GMBH ROBERT7 citations73
US6974709B2Dec 13, 2005
Method and device for providing a semiconductor etching end point and for detecting the end point
BOSCH GMBH ROBERT10 citations73
US7642545B2Jan 5, 2010
Layer and system with a silicon layer and a passivation layer, method for production of a passivation layer on a silicon layer and use thereof
BOSCH GMBH ROBERT3 citations62
US6709546B2Mar 23, 2004
Device and method for etching a substrate by using an inductively coupled plasma
BOSCH GMBH ROBERT2 citations62
US7288485B2Oct 30, 2007
Device and method for anisotropic plasma etching of a substrate, particularly a silicon element
BOSCH GMBH ROBERT4 citations60
US6663784B1Dec 16, 2003
Method for producing three-dimensional structures by means of an etching process
BOSCH GMBH ROBERT6 citations58
US7094706B2Aug 22, 2006
Device and method for etching a substrate by using an inductively coupled plasma
BOSCH GMBH ROBERT0 citations52