Inventor
OSAWA MORIMI
JP10 patents
⚠️ This page may combine multiple inventors who share the name “OSAWA MORIMI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
FUJITSU LTD
4 patentsUS6677089B2Jan 13, 2004
Rectangle/lattice data conversion method for charged particle beam exposure mask pattern and charged particle beam exposure method
FUJITSU LTD68 citations94
US6862726B2Mar 1, 2005
Light intensity simulation method, program product, and designing method of photomask
FUJITSU LTD35 citations91
US7205078B2Apr 17, 2007
Method for generating backscattering intensity on the basis of lower layer structure in charged particle beam exposure, and method for fabricating semiconductor device utilizing this method
FUJITSU LTD19 citations82
US7240307B2Jul 3, 2007
Pattern size correcting device and pattern size correcting method
FUJITSU LTD5 citations61
FUJITSU SEMICONDUCTOR LTD
3 patentsUS7971160B2Jun 28, 2011
Creating method of photomask pattern data, photomask created by using the photomask pattern data, and manufacturing method of semiconductor apparatus using the photomask
FUJITSU SEMICONDUCTOR LTD164 citations98
US7732107B2Jun 8, 2010
Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure
FUJITSU SEMICONDUCTOR LTD3 citations60
US7870520B2Jan 11, 2011
Semiconductor device and yield calculation method
FUJITSU SEMICONDUCTOR LTD1 citations50
YAO TERUYOSHI
2 patentsUS8553198B2Oct 8, 2013
Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure
YAO TERUYOSHI0 citations45
US8227153B2Jul 24, 2012
Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure
YAO TERUYOSHI0 citations45