Inventor

YAO TERUYOSHI

JP11 patents

⚠️ This page may combine multiple inventors who share the name “YAO TERUYOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

FUJITSU LTD

5 patents

US6420095B1Jul 16, 2002

Manufacture of semiconductor device using A-C anti-reflection coating

FUJITSU LTD25 citations91

US5750316AMay 12, 1998

Manufacture of semiconductor device using a-c anti-reflection coating

FUJITSU LTD48 citations91

US6986973B2Jan 17, 2006

Test photomask, flare evaluation method, and flare compensation method

FUJITSU LTD15 citations81

US7240307B2Jul 3, 2007

Pattern size correcting device and pattern size correcting method

FUJITSU LTD5 citations61

US7479356B2Jan 20, 2009

Aligning method

FUJITSU LTD0 citations40

FUJITSU MICROELECTRONICS LTD

2 patents

US7601471B2Oct 13, 2009

Apparatus and method for correcting pattern dimension and photo mask and test photo mask

FUJITSU MICROELECTRONICS LTD5 citations62

US7604912B2Oct 20, 2009

Local flare correction

FUJITSU MICROELECTRONICS LTD1 citations51

FUJITSU SEMICONDUCTOR LTD

2 patents

US7732103B2Jun 8, 2010

Photomask, focus measurement apparatus and focus measurement method

FUJITSU SEMICONDUCTOR LTD5 citations61

US7732107B2Jun 8, 2010

Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure

FUJITSU SEMICONDUCTOR LTD3 citations60

YAO TERUYOSHI

2 patents

US8553198B2Oct 8, 2013

Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure

YAO TERUYOSHI0 citations45

US8227153B2Jul 24, 2012

Mask pattern correction device, method of correcting mask pattern, light exposure correction device, and method of correcting light exposure

YAO TERUYOSHI0 citations45