Inventor
LANGE STEVEN R
US24 patents
⚠️ This page may combine multiple inventors who share the name “LANGE STEVEN R”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KLA TENCOR CORP
9 patentsUS6020957AFeb 1, 2000
System and method for inspecting semiconductor wafers
KLA TENCOR CORP205 citations99
US6791680B1Sep 14, 2004
System and method for inspecting semiconductor wafers
KLA TENCOR CORP49 citations96
US9696264B2Jul 4, 2017
Apparatus and methods for determining defect depths in vertical stack memory
KLA TENCOR CORP21 citations91
US9558858B2Jan 31, 2017
System and method for imaging a sample with a laser sustained plasma illumination output
KLA TENCOR CORP9 citations84
US9075027B2Jul 7, 2015
Apparatus and methods for detecting defects in vertical memory
KLA TENCOR CORP9 citations84
US8912495B2Dec 16, 2014
Multi-spectral defect inspection for 3D wafers
KLA TENCOR CORP18 citations84
US9612209B2Apr 4, 2017
Apparatus and methods for detecting defects in vertical memory
KLA TENCOR CORP2 citations73
US9599573B2Mar 21, 2017
Inspection systems and techniques with enhanced detection
KLA TENCOR CORP2 citations73
US11035804B2Jun 15, 2021
System and method for x-ray imaging and classification of volume defects
KLA TENCOR CORP0 citations50
KLA TENCOR TECH CORP
8 patentsUS7130037B1Oct 31, 2006
Systems for inspecting wafers and reticles with increased resolution
KLA TENCOR TECH CORP59 citations96
US6788404B2Sep 7, 2004
Inspection system with multiple illumination sources
KLA TENCOR TECH CORP56 citations96
US7351980B2Apr 1, 2008
All-reflective optical systems for broadband wafer inspection
KLA TENCOR TECH CORP19 citations92
US7001055B1Feb 21, 2006
Uniform pupil illumination for optical inspection systems
KLA TENCOR TECH CORP37 citations92
US6603541B2Aug 5, 2003
Wafer inspection using optimized geometry
KLA TENCOR TECH CORP24 citations92
US6862142B2Mar 1, 2005
Multi-detector microscopic inspection system
KLA TENCOR TECH CORP11 citations74
US7352456B2Apr 1, 2008
Method and apparatus for inspecting a substrate using a plurality of inspection wavelength regimes
KLA TENCOR TECH CORP4 citations63
US7031796B2Apr 18, 2006
Radiation damage reduction
KLA TENCOR TECH CORP4 citations63