Inventor
UENO RYOTA
JP2 patents
Patents
2 patentsUS12381091B2Aug 5, 2025
Method of processing substrate, method of manufacturing semiconductor device, recording medium, and substrate processing apparatus
KOKUSAI ELECTRIC CORP0 citations60
US11699593B2Jul 11, 2023
Method of manufacturing semiconductor device, substrate processing method, substrate processing apparatus, and recording medium
KOKUSAI ELECTRIC CORP0 citations60