Inventor

TAKEI TETSUYA

JP44 patents

⚠️ This page may combine multiple inventors who share the name “TAKEI TETSUYA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

TAKEI TETSUYA

CANON KK

Microwave plasma CVD apparatus with a deposition chamber having a circumferential wall comprising a curved moving substrate web and a microwave applicator means having a specific dielectric member on the exterior thereof

Process for continuously forming a large area functional deposited film by a microwave PCVD method and an apparatus suitable for practicing the same

Method and apparatus for continuously forming functional deposited films with a large area by a microwave plasma CVD method

Process for continuously forming a large area functional deposited film by microwave PCVD method and apparatus suitable for practicing the same

Method for continuously forming functional deposited films with a large area by a microwave plasma cvd method

Continuous film-forming process using microwave energy in a moving substrate web functioning as a substrate and plasma generating space

Apparatus for forming deposited films with microwave plasma CVD method

Microwave pcvd method for continuously forming a large area functional deposited film using a curved moving substrate web with microwave energy with a directivity in one direction perpendicular to the direction of microwave propagation

Apparatus for the formation of a functional deposited film using microwave plasma chemical vapor deposition process

Light receiving member having a multi-layered light receiving layer with an enhanced concentration of hydrogen or/and halogen atoms in the vicinity of the interface of adjacent layers

Microwave plasma CVD apparatus comprising coaxially aligned multiple gas pipe gas feed structure

Process and apparatus for microwave plasma chemical vapor deposition

Electrophotographic light-receiving member

Microwave plasma CVD apparatus for the formation of functional deposited film with discharge space provided with gas feed device capable of applying bias voltage between the gas feed device and substrate

Process and apparatus for the formation of a functional deposited film on a cylindrical substrate by means of microwave plasma chemical vapor deposition

Microwave plasma CVD apparatus having substrate shielding member

Cleaning device

Process for using microwave plasma CVD

Method for treating metal substrate for electro-photographic photosensitive member and method for manufacturing electrophotographic photosensitive member

Method for forming functional deposited films by means of microwave plasma chemical vapor deposition method

Method for forming functional deposited films by means of microwave plasma chemical vapor deposition method

Process for the formation of a functional deposited film by way of microwave plasma CVD method

Electrophotographic light receiving member having an outermost surface with a specific metal element-bearing region and a region substantially free of said metal element which are two-dimensionally distributed

Electrophotographic photosensitive member provided with a light receiving layer composed of a non-single crystal silicon material containing columnar structure regions and process for the production thereof

Apparatus for preparing a functional deposited film by microwave plasma chemical vapor deposition

Method for treating substrate for electrophotographic photosensitive member and method for making electrophotographic photosensitive member

Deposit film forming apparatus with microwave CVD method

Microwave plasma CVD apparatus provided with a microwave transmissive window made of specific ceramics for the formation of a functional deposited film

Method of preparation of functional deposited film by microwave plasma chemical vapor deposition

Light receiving member for use in electrophotography with a surface layer comprising non-single-crystal material containing tetrahedrally bonded boron nitride

Layered amorphous silicon photoconductor with surface layer having specific refractive index properties

Electrophotographic photosensitive member and method of manufacturing the same

Microwave plasma CVD apparatus having an improved microwave transmissive window

Process for forming a deposited film on each of a plurality of substrates by way of microwave plasma chemical vapor deposition method

Electrophotographic light-receiving member having surface region with high ratio of Si bonded to C

Electrophotographic process using light receiving member with buffer layer containing silicon and aluminum atoms on aluminum substrate

Layered light receiving member for electrophotography comprising buffer layer

Light receiving member with an amorphous silicon photoconductive layer containing fluorine atoms in an amount of 1 to 95 atomic ppm

FUJITSU LTD

Image-forming apparatus comprising a process unit

Image forming device

Dual-sided image forming device with improved recording medium correction part

Electrophotographic image-forming

Image-forming device having a plurality of image-forming units respectively apply the difference force to the recordable medium

HITACHI DISPLAYS LTD

Manufacturing method and manufacturing apparatus of display device