P

Inventor

TAKAI YASUYOSHI

JP47 patents
⚠️ This page may combine multiple inventors who share the name “TAKAI YASUYOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

CANON KK

36 patents
US6452091B1Sep 17, 2002

Method of producing thin-film single-crystal device, solar cell module and method of producing the same

CANON KK131 citations98
US7501305B2Mar 10, 2009

Method for forming deposited film and photovoltaic element

CANON KK21 citations93
US6855621B2Feb 15, 2005

Method of forming silicon-based thin film, method of forming silicon-based semiconductor layer, and photovoltaic element

CANON KK48 citations93
US6223684B1May 1, 2001

Film deposition apparatus

CANON KK43 citations93
US5232507AAug 3, 1993

Apparatus for forming deposited films with microwave plasma CVD method

CANON KK27 citations93
US5514506AMay 7, 1996

Light receiving member having a multi-layered light receiving layer with an enhanced concentration of hydrogen or/and halogen atoms in the vicinity of the interface of adjacent layers

CANON KK21 citations92
US5443645AAug 22, 1995

Microwave plasma CVD apparatus comprising coaxially aligned multiple gas pipe gas feed structure

CANON KK50 citations92
US5284730AFeb 8, 1994

Electrophotographic light-receiving member

CANON KK28 citations92
US6435130B1Aug 20, 2002

Plasma CVD apparatus and plasma processing method

CANON KK18 citations84
US6335281B1Jan 1, 2002

Deposited film forming process

CANON KK14 citations84
US6158382ADec 12, 2000

Method for forming a deposited film by plasma chemical vapor deposition and apparatus for forming a deposited film by plasma chemical vapor deposition

CANON KK17 citations84
US6156472ADec 5, 2000

Method of manufacturing electrophotographic photosensitive member

CANON KK17 citations84
US7112264B2Sep 26, 2006

Plating apparatus and method

CANON KK12 citations83
US5597623AJan 28, 1997

Process for using microwave plasma CVD

CANON KK16 citations82
US5314780AMay 24, 1994

Method for treating metal substrate for electro-photographic photosensitive member and method for manufacturing electrophotographic photosensitive member

CANON KK19 citations82
US6811816B2Nov 2, 2004

Method and apparatus for forming deposition film, and method for treating substrate

CANON KK7 citations74
US6783640B2Aug 31, 2004

Sputtering method and sputtering apparatus

CANON KK8 citations74
US6562400B2May 13, 2003

Method and apparatus for forming deposition film, and method for treating substrate

CANON KK8 citations74
US6103442AAug 15, 2000

Method and apparatus for producing electrophotographic photosensitive member

CANON KK8 citations74
US5853936ADec 29, 1998

Light receiving member, substrate for said light receiving member, and electrophotographic apparatus having said light receiving member

CANON KK11 citations74
US5624776AApr 29, 1997

Electrophotographic photosensitive member provided with a light receiving layer composed of a non-single crystal silicon material containing columnar structure regions and process for the production thereof

CANON KK10 citations74
US5480627AJan 2, 1996

Method for treating substrate for electrophotographic photosensitive member and method for making electrophotographic photosensitive member

CANON KK12 citations74
US5360484ANov 1, 1994

Microwave plasma CVD apparatus provided with a microwave transmissive window made of specific ceramics for the formation of a functional deposited film

CANON KK8 citations74
US6930025B2Aug 16, 2005

Transparent conductive film formation process, photovoltaic device production process, transparent conductive film, and photovoltaic device

CANON KK10 citations73
US5400630AMar 28, 1995

Method for producing regenerated cylinder, method for producing regenerated electrophotography photosensitive drum employing the method, and bulging apparatus for the methods

CANON KK7 citations73
US5273851ADec 28, 1993

Electrophotographic light-receiving member having surface region with high ratio of Si bonded to C

CANON KK10 citations72
US7700165B2Apr 20, 2010

Method of forming deposited film and method of forming photovoltaic element

CANON KK3 citations63
US6860974B2Mar 1, 2005

Long-Term sputtering method

CANON KK4 citations63
US6716324B2Apr 6, 2004

Method of forming transparent, conductive film, method of compensating defective region of semiconductor layer, photovoltaic element, and method of producing photovoltaic element

CANON KK3 citations63
US6694792B2Feb 24, 2004

Substrate treatment process

CANON KK5 citations63
US6406554B1Jun 18, 2002

Method and apparatus for producing electrophotographic photosensitive member

CANON KK4 citations63
US6365308B1Apr 2, 2002

Light receiving member for electrophotography

CANON KK3 citations63
US7534628B2May 19, 2009

Method for forming semiconductor device and method for forming photovoltaic device

CANON KK5 citations62
US7211708B2May 1, 2007

Exhaust processing method, plasma processing method and plasma processing apparatus

CANON KK2 citations62
US5943531AAug 24, 1999

Electrophotographic apparatus, image forming method, and process for fabricating light receiving member for electrophotography

CANON KK3 citations62
US6951585B2Oct 4, 2005

Liquid-phase growth method and liquid-phase growth apparatus

CANON KK0 citations52

YONEHARA TAKAO

3 patents

OFUJI MASATO

2 patents

SATO AYUMU

1 patent

YABUTA HISATO

1 patent

KAJI NOBUYUKI

1 patent

KANDORI ATSUSHI

1 patent

SOMEDA YASUHIRO

1 patent

HASEGAWA YOSHIHIRO

1 patent