Inventor
TAKAI YASUYOSHI
JP47 patents
⚠️ This page may combine multiple inventors who share the name “TAKAI YASUYOSHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
CANON KK
36 patentsUS6452091B1Sep 17, 2002
Method of producing thin-film single-crystal device, solar cell module and method of producing the same
CANON KK131 citations98
US7501305B2Mar 10, 2009
Method for forming deposited film and photovoltaic element
CANON KK21 citations93
US6855621B2Feb 15, 2005
Method of forming silicon-based thin film, method of forming silicon-based semiconductor layer, and photovoltaic element
CANON KK48 citations93
US6223684B1May 1, 2001
Film deposition apparatus
CANON KK43 citations93
US5232507AAug 3, 1993
Apparatus for forming deposited films with microwave plasma CVD method
CANON KK27 citations93
US5514506AMay 7, 1996
Light receiving member having a multi-layered light receiving layer with an enhanced concentration of hydrogen or/and halogen atoms in the vicinity of the interface of adjacent layers
CANON KK21 citations92
US5443645AAug 22, 1995
Microwave plasma CVD apparatus comprising coaxially aligned multiple gas pipe gas feed structure
CANON KK50 citations92
US5284730AFeb 8, 1994
Electrophotographic light-receiving member
CANON KK28 citations92
US6435130B1Aug 20, 2002
Plasma CVD apparatus and plasma processing method
CANON KK18 citations84
US6335281B1Jan 1, 2002
Deposited film forming process
CANON KK14 citations84
US6158382ADec 12, 2000
Method for forming a deposited film by plasma chemical vapor deposition and apparatus for forming a deposited film by plasma chemical vapor deposition
CANON KK17 citations84
US6156472ADec 5, 2000
Method of manufacturing electrophotographic photosensitive member
CANON KK17 citations84
US7112264B2Sep 26, 2006
Plating apparatus and method
CANON KK12 citations83
US5597623AJan 28, 1997
Process for using microwave plasma CVD
CANON KK16 citations82
US5314780AMay 24, 1994
Method for treating metal substrate for electro-photographic photosensitive member and method for manufacturing electrophotographic photosensitive member
CANON KK19 citations82
US6811816B2Nov 2, 2004
Method and apparatus for forming deposition film, and method for treating substrate
CANON KK7 citations74
US6783640B2Aug 31, 2004
Sputtering method and sputtering apparatus
CANON KK8 citations74
US6562400B2May 13, 2003
Method and apparatus for forming deposition film, and method for treating substrate
CANON KK8 citations74
US6103442AAug 15, 2000
Method and apparatus for producing electrophotographic photosensitive member
CANON KK8 citations74
US5853936ADec 29, 1998
Light receiving member, substrate for said light receiving member, and electrophotographic apparatus having said light receiving member
CANON KK11 citations74
US5624776AApr 29, 1997
Electrophotographic photosensitive member provided with a light receiving layer composed of a non-single crystal silicon material containing columnar structure regions and process for the production thereof
CANON KK10 citations74
US5480627AJan 2, 1996
Method for treating substrate for electrophotographic photosensitive member and method for making electrophotographic photosensitive member
CANON KK12 citations74
US5360484ANov 1, 1994
Microwave plasma CVD apparatus provided with a microwave transmissive window made of specific ceramics for the formation of a functional deposited film
CANON KK8 citations74
US6930025B2Aug 16, 2005
Transparent conductive film formation process, photovoltaic device production process, transparent conductive film, and photovoltaic device
CANON KK10 citations73
US5400630AMar 28, 1995
Method for producing regenerated cylinder, method for producing regenerated electrophotography photosensitive drum employing the method, and bulging apparatus for the methods
CANON KK7 citations73
US5273851ADec 28, 1993
Electrophotographic light-receiving member having surface region with high ratio of Si bonded to C
CANON KK10 citations72
US7700165B2Apr 20, 2010
Method of forming deposited film and method of forming photovoltaic element
CANON KK3 citations63
US6860974B2Mar 1, 2005
Long-Term sputtering method
CANON KK4 citations63
US6716324B2Apr 6, 2004
Method of forming transparent, conductive film, method of compensating defective region of semiconductor layer, photovoltaic element, and method of producing photovoltaic element
CANON KK3 citations63
US6694792B2Feb 24, 2004
Substrate treatment process
CANON KK5 citations63
US6406554B1Jun 18, 2002
Method and apparatus for producing electrophotographic photosensitive member
CANON KK4 citations63
US6365308B1Apr 2, 2002
Light receiving member for electrophotography
CANON KK3 citations63
US7534628B2May 19, 2009
Method for forming semiconductor device and method for forming photovoltaic device
CANON KK5 citations62
US7211708B2May 1, 2007
Exhaust processing method, plasma processing method and plasma processing apparatus
CANON KK2 citations62
US5943531AAug 24, 1999
Electrophotographic apparatus, image forming method, and process for fabricating light receiving member for electrophotography
CANON KK3 citations62
US6951585B2Oct 4, 2005
Liquid-phase growth method and liquid-phase growth apparatus
CANON KK0 citations52
YONEHARA TAKAO
3 patentsUS8420501B2Apr 16, 2013
Transfer method of functional region, LED array, LED printer head, and LED printer
YONEHARA TAKAO2 citations62
US8415230B2Apr 9, 2013
Method for transferring functional regions, LED array, LED printer head, and LED printer
YONEHARA TAKAO2 citations62
US8507360B2Aug 13, 2013
Transfer method of functional region, LED array, LED printer head, and LED printer
YONEHARA TAKAO1 citations52