Inventor
MURAI FUMIO
JP37 patents
⚠️ This page may combine multiple inventors who share the name “MURAI FUMIO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
HITACHI LTD
35 patentsUS6518548B2Feb 11, 2003
Substrate temperature control system and method for controlling temperature of substrate
HITACHI LTD269 citations98
US6394797B1May 28, 2002
Substrate temperature control system and method for controlling temperature of substrate
HITACHI LTD182 citations98
US6709880B2Mar 23, 2004
Semiconductor device and a manufacturing method of the same
HITACHI LTD130 citations97
US6964832B2Nov 15, 2005
Semiconductor device and manufacturing method thereof
HITACHI LTD61 citations96
US6057081AMay 2, 2000
Process for manufacturing semiconductor integrated circuit device
HITACHI LTD50 citations96
US5429896AJul 4, 1995
Photomask and pattern forming method employing the same
HITACHI LTD58 citations96
US6845497B2Jan 18, 2005
Method for fabrication of patterns and semiconductor devices
HITACHI LTD36 citations93
US5318868AJun 7, 1994
Photomask and method for manufacturing semiconductor device using photomask
HITACHI LTD21 citations93
US5278421AJan 11, 1994
Pattern fabrication method using a charged particle beam and apparatus for realizing same
HITACHI LTD24 citations93
US6497992B1Dec 24, 2002
Process for manufacturing semiconductor integrated circuit device
HITACHI LTD32 citations92
US5757409AMay 26, 1998
Exposure method and pattern data preparation system therefor, pattern data preparation method and mask as well as exposure apparatus
HITACHI LTD25 citations92
US5557314ASep 17, 1996
Exposure method and pattern data preparation system therefor, pattern data preparation method and mask as well as exposure apparatus
HITACHI LTD20 citations92
US5350485ASep 27, 1994
High-resolution lithography and semiconductor device manufacturing method
HITACHI LTD30 citations92
US5324550AJun 28, 1994
Pattern forming method
HITACHI LTD21 citations92
US5061599AOct 29, 1991
Radiation sensitive materials
HITACHI LTD26 citations92
US4315984AFeb 16, 1982
Method of producing a semiconductor device
HITACHI LTD43 citations92
US5441849AAug 15, 1995
Method of forming pattern and making semiconductor device using radiation-induced conductive resin bottom resist layer
HITACHI LTD30 citations91
US5256454AOct 26, 1993
Method for suppression of electrification
HITACHI LTD24 citations91
US5250812AOct 5, 1993
Electron beam lithography using an aperture having an array of repeated unit patterns
HITACHI LTD25 citations90
US6586341B2Jul 1, 2003
Method of manufacturing semiconductor device
HITACHI LTD16 citations84
US5578421ANov 26, 1996
Photomask and pattern forming method employing the same
HITACHI LTD10 citations82
US5437893AAug 1, 1995
Method for suppression of electrification
HITACHI LTD17 citations81
US4403151ASep 6, 1983
Method of forming patterns
HITACHI LTD26 citations79
US5851703ADec 22, 1998
Photomask and pattern forming method employing the same
HITACHI LTD6 citations74
US5656400AAug 12, 1997
Photomask and pattern forming method employing the same
HITACHI LTD7 citations74
US5334845AAug 2, 1994
Charged beam exposure method and apparatus as well as aperture stop and production method thereof
HITACHI LTD8 citations74
US5149975ASep 22, 1992
Pattern fabrication method using a charged particle beam and apparatus for realizing same
HITACHI LTD11 citations74
US4983532AJan 8, 1991
Process for fabricating heterojunction bipolar transistors
HITACHI LTD11 citations74
US4983864AJan 8, 1991
Electronic beam drawing apparatus
HITACHI LTD10 citations74
US5589270ADec 31, 1996
Processed substrate obtained by a process for effecting suppression of electrification
HITACHI LTD12 citations72
US6258513B1Jul 10, 2001
Photomask and pattern forming method employing the same
HITACHI LTD1 citations63
US6087074AJul 11, 2000
Photomask and pattern forming method employing the same
HITACHI LTD2 citations63
US6013398AJan 11, 2000
Photomask and pattern forming method employing the same
HITACHI LTD2 citations63
US5317168AMay 31, 1994
Superconducting field effect transistor
HITACHI LTD3 citations63
US6383718B2May 7, 2002
Photomask and pattern forming method employing the same
HITACHI LTD0 citations52