Inventor
YAMAOKA TSUGUO
JP35 patents
⚠️ This page may combine multiple inventors who share the name “YAMAOKA TSUGUO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SHINETSU CHEMICAL CO
6 patentsUS5942367AAug 24, 1999
Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group
SHINETSU CHEMICAL CO91 citations99
US5882844AMar 16, 1999
Chemically amplified positive resist composition
SHINETSU CHEMICAL CO60 citations96
US5876900AMar 2, 1999
Chemically amplified positive resist composition
SHINETSU CHEMICAL CO68 citations96
US6312869B1Nov 6, 2001
Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group
SHINETSU CHEMICAL CO20 citations93
US6114462ASep 5, 2000
Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group
SHINETSU CHEMICAL CO28 citations93
US6335141B1Jan 1, 2002
Chemically amplified positive resist composition, pattern forming method, and method for preparing polymer having a crosslinking group
SHINETSU CHEMICAL CO13 citations74
FUJI PHOTO FILM CO LTD
6 patentsUS6245485B1Jun 12, 2001
Positive resist composition
FUJI PHOTO FILM CO LTD24 citations92
US5939235AAug 17, 1999
Positive-working light-sensitive composition
FUJI PHOTO FILM CO LTD49 citations92
US5364738ANov 15, 1994
Light-sensitive composition
FUJI PHOTO FILM CO LTD35 citations92
US5320931AJun 14, 1994
Light-sensitive composition
FUJI PHOTO FILM CO LTD23 citations92
US5250385AOct 5, 1993
Photopolymerizable composition
FUJI PHOTO FILM CO LTD14 citations74
US5202216AApr 13, 1993
Positive working photosensitive composition
FUJI PHOTO FILM CO LTD10 citations74
KANSAI PAINT CO LTD
4 patentsUS5496678AMar 5, 1996
Photosensitive compositions containing a polymer with carboxyl and hydroxyphenyl groups, a compound with multiple ethylenic unsaturation and a photo-acid generator
KANSAI PAINT CO LTD26 citations92
US5650259AJul 22, 1997
Processes for pattern formation using photosensitive compositions and liquid development
KANSAI PAINT CO LTD6 citations74
US5527656AJun 18, 1996
Positive type electrodeposition photoresist compositions
KANSAI PAINT CO LTD10 citations74
US5702872ADec 30, 1997
Process for resist pattern formation using positive electrodeposition photoresist compositions
KANSAI PAINT CO LTD3 citations63
KYOWA HAKKO KOGYO KK
4 patentsUS5681685AOct 28, 1997
Photopolymerizable composition containing squarylium compound
KYOWA HAKKO KOGYO KK10 citations72
US5527659AJun 18, 1996
Chemical amplification resist composition containing photochemical acid generator, binder and squarylium compound
KYOWA HAKKO KOGYO KK18 citations71
US5756258AMay 26, 1998
Photopolymerizable composition containing an addition polymerizable compound, a radical-producing agent and a squarylium compound
KYOWA HAKKO KOGYO KK15 citations70
US7294448B2Nov 13, 2007
Composition sensitive to visible light
KYOWA HAKKO KOGYO KK0 citations52
DAIKIN IND LTD
3 patentsUS4424325AJan 3, 1984
Photosensitive material
DAIKIN IND LTD78 citations92
US4365049ADec 21, 1982
Fluoroalkyl acrylate copolymer and composition containing the same
DAIKIN IND LTD49 citations92
US4529783AJul 16, 1985
Novel copolymer and photosensitive material containing the same
DAIKIN IND LTD19 citations82