Inventor
SHIMADA TOSHIYA
JP11 patents
⚠️ This page may combine multiple inventors who share the name “SHIMADA TOSHIYA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
KOKUSAI ELECTRIC CORP
3 patentsUS11101111B2Aug 24, 2021
Substrate processing apparatus, method of manufacturing semiconductor device, and baffle structure of the substrate processing apparatus
KOKUSAI ELECTRIC CORP3 citations71
US12505989B2Dec 23, 2025
Substrate processing apparatus, and method of manufacturing semiconductor device
KOKUSAI ELECTRIC CORP0 citations60
US11948778B2Apr 2, 2024
Substrate processing apparatus, method of manufacturing semiconductor device, and baffle structure of the substrate processing apparatus
KOKUSAI ELECTRIC CORP0 citations60
KAO CORP
3 patentsUS6410605B1Jun 25, 2002
Process for preparing emulsion
KAO CORP13 citations68
US7691413B2Apr 6, 2010
Composite particle and process for producing the same
KAO CORP2 citations60
US5613848AMar 25, 1997
Process for the production of glass-like carbon substrates for use as recording media and a setter for use in the process
KAO CORP6 citations60
HITACHI INT ELECTRIC INC
2 patentsUS10763084B2Sep 1, 2020
Substrate processing apparatus, method of manufacturing semiconductor device, and baffle structure of the substrate processing apparatus
HITACHI INT ELECTRIC INC4 citations82
US10403478B2Sep 3, 2019
Plasma processing apparatus and method of manufacturing semiconductor device
HITACHI INT ELECTRIC INC0 citations40