Inventor
NADEAU DOUGLAS P
US12 patents
Patents
12 patentsUS5913713AJun 22, 1999
CMP polishing pad backside modifications for advantageous polishing results
IBM95 citations97
US5778481AJul 14, 1998
Silicon wafer cleaning and polishing pads
IBM102 citations93
US6432823B1Aug 13, 2002
Off-concentric polishing system design
IBM42 citations92
US5834642ANov 10, 1998
Downstream monitor for CMP brush cleaners
IBM17 citations91
US6273797B1Aug 14, 2001
In-situ automated CMP wedge conditioner
IBM28 citations90
US6287178B1Sep 11, 2001
Wafer carrier rinsing mechanism
IBM22 citations89
US5894622AApr 20, 1999
Brush conditioner wing
IBM20 citations88
US6647579B2Nov 18, 2003
Brush pressure control system for chemical and mechanical treatment of semiconductor surfaces
IBM15 citations83
US6300246B1Oct 9, 2001
Method for chemical mechanical polishing of semiconductor wafer
IBM18 citations83
US7480888B1Jan 20, 2009
Design structure for facilitating engineering changes in integrated circuits
IBM14 citations80
US5974868ANov 2, 1999
Downstream monitor for CMP brush cleaners
IBM13 citations72
US6247368B1Jun 19, 2001
CMP wet application wafer sensor
IBM2 citations59