Inventor

SINGH VIKRAM

IN126 patents

⚠️ This page may combine multiple inventors who share the name “SINGH VIKRAM”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SINGH VIKRAM

VARIAN SEMICONDUCTOR EQUIPMENT

Plasma processing with enhanced charge neutralization and process control

Technique for monitoring and controlling a plasma process

Conformal doping apparatus and method

Technique for boron implantation

Apparatus and method for controllably implanting workpieces

Implantation of multiple species to address copper reliability

Technique for monitoring and controlling a plasma process

Profile adjustment in plasma ion implanter

Implantation of multiple species to address copper reliability

Enhanced etch and deposition profile control using plasma sheath engineering

Profile adjustment in plasma ion implanter

NOVELLUS SYSTEMS INC

High-density plasma process for filling high aspect ratio structures

Gap fill for high aspect ratio structures

Gap fill for high aspect ratio structures

Hydrogen-based phosphosilicate glass process for gap fill of high aspect ratio structures

Predictive wafer temperature control system and method

Gap fill for high aspect ratio structures

Deposition profile modification through process chemistry

QUALCOMM INC

Clock synchronization for multi-processor/multi-chipset solution

Triggering user equipment (UE) assistance information based on mobility and wake up signal (WUS) configuration

Techniques for packet-switched video telephony setup with QOS preconditions

Evolved hybrid internet protocol (IP) multimedia subsystem (IMS) architecture

Switching display devices in video telephony

GODET LUDOVIC

Plasma processing apparatus

Plasma processing apparatus

Ion source

Enhanced etch and deposition profile control using plasma sheath engineering

VARIAN SEMICONDUCTOR EQUIPMENT ASS INC

Control of ion angular distribution of ion beams with hidden deflection electrode

Apparatus and techniques to treat substrates using directional plasma and reactive gas

Radio frequency extraction system for charge neutralized ion beam

Apparatus and techniques to treat substrates using directional plasma and reactive gas

LAM RES CORP

Method and apparatus for improving etch and deposition uniformity in plasma semiconductor processing

Methods and apparatus for passivating a substrate in a plasma reactor

Focus rings

SAMSUNG ELECTRONICS CO LTD

Method of managing input/output(I/O) queues by non-volatile memory express(NVME) controller

Computing system with resource management mechanism and method of operation thereof

Computing system with resource management mechanism and method of operation thereof

SINGH VIKRAM

Integrated controlled freeze zone (CFZ) tower and dividing wall (DWC) for enhanced hydrocarbon recovery

DC-AC converter

Distillation tower feed device

PAPASOULIOTIS GEORGE D

Techniques for plasma processing a substrate

Method of processing a substrate having a non-planar surface

GEN ELECTRIC

Method of designing an electronic transaction system

Method and apparatus for screening transactions across a global computer network

ST MICROELECTRONICS INT NV

Timing skew mismatch calibration for time interleaved analog to digital converters

Timing skew mismatch calibration for time interleaved analog to digital converters

MIXHALO CORP

Systems and methods for providing real-time audio and data

HADIDI KAMAL

System and method for selectively controlling ion composition of ion sources

SHARMA ARUN K

De-entrainment tray for high capacity operation

ENGLAND JONATHAN GERALD

Techniques for temperature-controlled ion implantation