Inventor

WU JUAN-YUAN

TW62 patents

⚠️ This page may combine multiple inventors who share the name “WU JUAN-YUAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

WU JUAN-YUAN

UNITED MICROELECTRONICS CORP

Method of gap filling

Chemical mechanical polishing for forming a shallow trench isolation structure

Apparatus for controlling uniformity of polished material

High density plasma chemical vapor deposition process

Chemical mechanical polishing for forming a shallow trench isolation structure

Method for improving non-uniformity of chemical mechanical polishing by over coating

Method of fabricating dual damascene

Method of fabricating dual damascene structure

Method for forming dielectric layers

Method of improving surface planarity of chemical-mechanical polishing operation by forming shallow dummy pattern

Method of designing active region pattern with shift dummy pattern

Method of fabricating a dual damascene structure in an integrated circuit

Physical vapor deposition device for forming a uniform metal layer on a semiconductor wafer

Shallow trench isolation technique

Chemical-mechanical polishing for shallow trench isolation

Chemical-mechanical polish machines and fabrication process using the same

Chemical-mechanical polish machines and fabrication process using the same

Method of fabricating shallow trench isolation (STI)

Chemical-mechanical polishing station with end-point monitoring device

Structure of an antenna effect monitor

Method for enhancing adhesion between copper and silicon nitride

Chemical mechanical polishing in forming semiconductor device

Method for forming a gate

Circulation system of slurry

In-situ slurry mixing apparatus

Chemical mechanical polishing for forming a shallow trench isolation structure

Method for monitoring a semiconductor wafer in a chemical mechanical polishing process

Method for forming dielectric layers

Chemical mechanical polishing for forming a shallow trench isolation structure

Method of improving deposition

Method for preventing an electrostatic chuck from being corroded during a cleaning process

Equipment for forming a glue layer of an opening

Conformity of ultra-thin nitride deposition for DRAM capacitor

Method of forming capacitor with a HSG layer

Method for fabricating a capacitor

Chemical mechanical polishing apparatus for controlling slurry distribution

Post-CMP wafer clean process

Method of fabricating a trench isolation structure using a reverse mask

Manufacturing method for integrated circuit dielectric layer

High density plasma chemical vapor deposition process

High density plasma chemical vapor deposition process

Method of photolithography

Method of manufacturing binary phase shift mask

Chemical mechanical polish machines and fabrication process using the same

Method of preventing micro-scratches on the surface of a semiconductor wafer when performing a CMP process

Method of forming partial reverse active mask

Method for forming dielectric layers

Chemical mechanical polishing for forming a shallow trench isolation structure

Chemical mechanical polishing methods using low pH slurry mixtures

LIU CHIH-CHIEN

High density plasma chemical vapor deposition process