Inventor
SATO SHUZO
JP37 patents
⚠️ This page may combine multiple inventors who share the name “SATO SHUZO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SONY CORP
32 patentsUS6693036B1Feb 17, 2004
Method for producing semiconductor device polishing apparatus, and polishing method
SONY CORP121 citations99
US6846227B2Jan 25, 2005
Electro-chemical machining appartus
SONY CORP81 citations97
US6386956B1May 14, 2002
Flattening polishing device and flattening polishing method
SONY CORP185 citations94
US6808617B2Oct 26, 2004
Electrolytic polishing method
SONY CORP21 citations92
US6797623B2Sep 28, 2004
Methods of producing and polishing semiconductor device and polishing apparatus
SONY CORP30 citations92
US6638564B2Oct 28, 2003
Method of electroless plating and electroless plating apparatus
SONY CORP46 citations92
US6077155AJun 20, 2000
Polishing device and correcting method therefor
SONY CORP22 citations92
US6039631AMar 21, 2000
Polishing method, abrasive material, and polishing apparatus
SONY CORP34 citations92
US5727111AMar 10, 1998
Optical pick-up and light detecting cover therefor
SONY CORP24 citations92
US5681212AOct 28, 1997
Polishing device and correcting method therefor
SONY CORP27 citations92
US6280292B1Aug 28, 2001
Polishing apparatus
SONY CORP25 citations91
US6722962B1Apr 20, 2004
Polishing system, polishing method, polishing pad, and method of forming polishing pad
SONY CORP35 citations90
US6139400AOct 31, 2000
Polishing system and method with polishing pad pressure adjustment
SONY CORP31 citations90
US5812407ASep 22, 1998
Apparatus for correcting and holding front surface of sheet
SONY CORP50 citations88
US7186322B2Mar 6, 2007
Methods of producing and polishing semiconductor device and polishing apparatus
SONY CORP14 citations83
US6695682B2Feb 24, 2004
Polishing method and polishing apparatus
SONY CORP11 citations74
US6461222B1Oct 8, 2002
Planarizing and polishing apparatus and planarizing and polishing method
SONY CORP13 citations74
US10431618B2Oct 1, 2019
Stacked lens structure method of manufacturing the same, and electronic apparatus
SONY CORP1 citations73
US7255784B2Aug 14, 2007
Polishing method and electropolishing apparatus
SONY CORP6 citations73
US7156975B2Jan 2, 2007
Polishing method and electropolishing apparatus
SONY CORP5 citations73
US6126511AOct 3, 2000
Polishing device and correcting method therefor
SONY CORP8 citations73
US6520835B1Feb 18, 2003
Polishing system, polishing method, polishing pad, and method of forming polishing pad
SONY CORP11 citations71
US6835292B2Dec 28, 2004
Electrochemical thin film polishing method and polishing apparatus
SONY CORP10 citations70
US7232760B2Jun 19, 2007
Method for producing semiconductor device, polishing apparatus, and polishing method
SONY CORP3 citations63
US6855634B2Feb 15, 2005
Polishing method and polishing apparatus
SONY CORP2 citations63
US11342371B2May 24, 2022
Stacked lens structure, method of manufacturing the same, and electronic apparatus
SONY CORP0 citations62
US10818717B2Oct 27, 2020
Stacked lens structure, method of manufacturing the same, and electronic apparatus
SONY CORP0 citations52
US7141501B2Nov 28, 2006
Polishing method, polishing apparatus, and method of manufacturing semiconductor device
SONY CORP0 citations52
US6911396B2Jun 28, 2005
Method of producing metallic film
SONY CORP1 citations52
US6440855B1Aug 27, 2002
Method of processing surface of workpiece and method of forming semiconductor thin layer
SONY CORP1 citations52
US10185138B2Jan 22, 2019
Imaging apparatus
SONY CORP0 citations51
US7033943B2Apr 25, 2006
Etching solution, etching method and method for manufacturing semiconductor device
SONY CORP0 citations51