Inventor

JEONG HYUN DAM

KR24 patents

⚠️ This page may combine multiple inventors who share the name “JEONG HYUN DAM”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

JEONG HYUN DAM

SAMSUNG ELECTRONICS CO LTD

Multi-layered dielectric layer including insulating layer having Si-CH3 bond therein and method for fabricating the same

Method for forming insulating film between interconnect layers in microelectronic devices

Siloxane-based resin and method for forming insulating film between interconnect layers in semiconductor devices by using the same

Composition for dielectric thin film, metal oxide dielectric thin film using the same and preparation method thereof

Composition for forming low dielectric thin film including siloxane monomer or siloxane polymer having only one type of stereoisomer and method of producing low dielectric thin film using same

Siloxane-based resin and interlayer insulating film formed using the same

Multi-functional linear siloxane compound, a siloxane polymer prepared from the compound, and a process for forming a dielectric film by using the polymer

Multi-functional cyclic siloxane compound, a siloxane-based polymer prepared from the compound and a process for preparing a dielectric film by using the polymer

Method for forming interlayer dielectric film for semiconductor device by using polyhedral molecular silsesquioxane

Method of forming a porous material layer in a semiconductor device

Siloxane-based resin and method for forming insulating film between interconnect layers in semiconductor devices by using the same

Multi-functional linear siloxane compound, a siloxane polymer prepared from the compound, and a process for forming a dielectric film by using the polymer

Multi-functional cyclic siloxane compound and process for preparing dielectric film by using siloxane-based polymer prepared from the compound

Method for fabricating a multi-layered dielectric layer including insulating layer having Si-CH3 bond therein

Multi-functional cyclic silicate compound, siloxane-based polymer prepared from the compound and process of producing insulating film using the polymer

Multi-functional cyclic silicate compound, siloxane-based polymer prepared from the compound and process of producing insulating film using the polymer

JANG HYUNG WOOK

Virtual golf simulation apparatus and method and sensing device and method used for the same

Virtual golf simulation apparatus and sensing device and method used for the same

Virtual golf simulation apparatus and sensing device and method used for the same

JANG EUN JOO

Thin film containing nanocrystal particles and method for preparing the same

PARK HYUN JIN

Sensing device and method used for virtual golf simulation apparatus

SEON JONG BAEK

Organosilicon nanocluster, method of preparing the same and method of forming thin film using the same

UNIV NAT CHONNAM IND FOUND

Tin compounds containing a tin-oxygen double bond, a photoresist composition containing the same and a method of forming a photoresist pattern using the same

SAMSUNG CORNING PREC GLASS CO

Semiconductor thin film using self-assembled monolayers and methods of production thereof