Inventor
YOKOTA YOSHITAKA
US22 patents
⚠️ This page may combine multiple inventors who share the name “YOKOTA YOSHITAKA”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
12 patentsUS7547633B2Jun 16, 2009
UV assisted thermal processing
APPLIED MATERIALS INC473 citations98
US6713127B2Mar 30, 2004
Methods for silicon oxide and oxynitride deposition using single wafer low pressure CVD
APPLIED MATERIALS INC82 citations96
US7972441B2Jul 5, 2011
Thermal oxidation of silicon using ozone
APPLIED MATERIALS INC22 citations91
US8741785B2Jun 3, 2014
Remote plasma radical treatment of silicon oxide
APPLIED MATERIALS INC7 citations84
US9023700B2May 5, 2015
Method and apparatus for single step selective nitridation
APPLIED MATERIALS INC5 citations83
US7951728B2May 31, 2011
Method of improving oxide growth rate of selective oxidation processes
APPLIED MATERIALS INC7 citations83
US7947561B2May 24, 2011
Methods for oxidation of a semiconductor device
APPLIED MATERIALS INC14 citations83
US8888916B2Nov 18, 2014
Thermal reactor with improved gas flow distribution
APPLIED MATERIALS INC6 citations82
US8916484B2Dec 23, 2014
Remote plasma radical treatment of silicon oxide
APPLIED MATERIALS INC2 citations63
US8043981B2Oct 25, 2011
Dual frequency low temperature oxidation of a semiconductor device
APPLIED MATERIALS INC6 citations63
US9117661B2Aug 25, 2015
Method of improving oxide growth rate of selective oxidation processes
APPLIED MATERIALS INC3 citations62
US9530898B2Dec 27, 2016
Semiconductor devices suitable for narrow pitch applications and methods of fabrication thereof
APPLIED MATERIALS INC0 citations49
YOKOTA YOSHITAKA
4 patentsUS8546271B2Oct 1, 2013
Method of improving oxide growth rate of selective oxidation processes
YOKOTA YOSHITAKA5 citations82
US8492292B2Jul 23, 2013
Methods of forming oxide layers on substrates
YOKOTA YOSHITAKA7 citations82
US8409353B2Apr 2, 2013
Water cooled gas injector
YOKOTA YOSHITAKA6 citations82
US8497193B2Jul 30, 2013
Method of thermally treating silicon with oxygen
YOKOTA YOSHITAKA0 citations50