Inventor
BROWN IAN J
GB24 patents
⚠️ This page may combine multiple inventors who share the name “BROWN IAN J”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
15 patentsUS7795148B2Sep 14, 2010
Method for removing damaged dielectric material
TOKYO ELECTRON LTD47 citations93
US9735026B2Aug 15, 2017
Controlling cleaning of a layer on a substrate using nozzles
TOKYO ELECTRON LTD7 citations83
US7723237B2May 25, 2010
Method for selective removal of damaged multi-stack bilayer films
TOKYO ELECTRON LTD12 citations82
US9454081B2Sep 27, 2016
Line pattern collapse mitigation through gap-fill material application
TOKYO ELECTRON LTD4 citations72
US9513556B2Dec 6, 2016
Method and system of process chemical temperature control using an injection nozzle
TOKYO ELECTRON LTD2 citations62
US7288483B1Oct 30, 2007
Method and system for patterning a dielectric film
TOKYO ELECTRON LTD6 citations62
US11538684B2Dec 27, 2022
UV-assisted stripping of hardened photoresist to create chemical templates for directed self-assembly
TOKYO ELECTRON LTD0 citations58
US10347503B2Jul 9, 2019
Method and hardware for enhanced removal of post etch polymer and hardmask removal
TOKYO ELECTRON LTD0 citations52
US10490399B2Nov 26, 2019
Systems and methodologies for vapor phase hydroxyl radical processing of substrates
TOKYO ELECTRON LTD0 citations51
US9852920B2Dec 26, 2017
Etch system and method for single substrate processing
TOKYO ELECTRON LTD1 citations51
US10828680B2Nov 10, 2020
System and method for enhanced removal of metal hardmask using ultra violet treatment
TOKYO ELECTRON LTD0 citations41
US10249509B2Apr 2, 2019
Substrate cleaning method and system using atmospheric pressure atomic oxygen
TOKYO ELECTRON LTD0 citations41
US9966280B2May 8, 2018
Process gas generation for cleaning of substrates
TOKYO ELECTRON LTD0 citations41
US9875916B2Jan 23, 2018
Method of stripping photoresist on a single substrate system
TOKYO ELECTRON LTD0 citations41
US9327322B2May 3, 2016
Sonic energy to generate active species for surface preparation, cleaning, and etching
TOKYO ELECTRON LTD0 citations41
BROWN IAN J
4 patentsUS8083862B2Dec 27, 2011
Method and system for monitoring contamination on a substrate
BROWN IAN J8 citations82
US9257292B2Feb 9, 2016
Etch system and method for single substrate processing
BROWN IAN J2 citations60
US9075318B2Jul 7, 2015
Sequential stage mixing for a resist batch strip process
BROWN IAN J0 citations39
US8940103B2Jan 27, 2015
Sequential stage mixing for single substrate strip processing
BROWN IAN J0 citations39