Inventor
FUJISAWA TADAHITO
JP38 patents
⚠️ This page may combine multiple inventors who share the name “FUJISAWA TADAHITO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
36 patentsUS5673103ASep 30, 1997
Exposure apparatus and method
TOSHIBA KK199 citations99
US5627626AMay 6, 1997
Projectin exposure apparatus
TOSHIBA KK102 citations99
US5621498AApr 15, 1997
Projection exposure apparatus
TOSHIBA KK101 citations99
US6440616B1Aug 27, 2002
Mask and method for focus monitoring
TOSHIBA KK63 citations96
US6376139B1Apr 23, 2002
Control method for exposure apparatus and control method for semiconductor manufacturing apparatus
TOSHIBA KK70 citations96
US5707501AJan 13, 1998
Filter manufacturing apparatus
TOSHIBA KK81 citations96
US7669172B2Feb 23, 2010
Pattern creation method, mask manufacturing method and semiconductor device manufacturing method
TOSHIBA KK25 citations93
US6317198B1Nov 13, 2001
Method of examining an exposure tool
TOSHIBA KK48 citations93
US6226074B1May 1, 2001
Exposure monitor mask, exposure adjusting method and method of manufacturing semiconductor devices
TOSHIBA KK41 citations93
US7474386B2Jan 6, 2009
Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semiconductor device manufacturing method using a wafer evaluated by the evaluation method
TOSHIBA KK14 citations92
US6813001B2Nov 2, 2004
Exposure method and apparatus
TOSHIBA KK20 citations92
US6741334B2May 25, 2004
Exposure method, exposure system and recording medium
TOSHIBA KK28 citations92
US6701512B2Mar 2, 2004
Focus monitoring method, exposure apparatus, and exposure mask
TOSHIBA KK43 citations92
US6667139B2Dec 23, 2003
Method of manufacturing semiconductor device
TOSHIBA KK35 citations92
US7396621B2Jul 8, 2008
Exposure control method and method of manufacturing a semiconductor device
TOSHIBA KK13 citations84
US7250235B2Jul 31, 2007
Focus monitor method and mask
TOSHIBA KK15 citations84
US7108945B2Sep 19, 2006
Photomask having a focus monitor pattern
TOSHIBA KK16 citations84
US7700997B2Apr 20, 2010
Semiconductor memory device
TOSHIBA KK15 citations82
US7510341B2Mar 31, 2009
Temperature calibration method for baking processing apparatus, adjustment method for development processing apparatus, and method of manufacturing semiconductor apparatus
TOSHIBA KK14 citations82
US7175943B2Feb 13, 2007
Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device
TOSHIBA KK9 citations74
US6252651B1Jun 26, 2001
Exposure method and exposure apparatus using it
TOSHIBA KK10 citations74
US6107013AAug 22, 2000
Exposure method and exposure apparatus using it
TOSHIBA KK8 citations74
US5733687AMar 31, 1998
Photomask, exposing method using photomask, and manufacturing method of photomask
TOSHIBA KK12 citations74
US7716617B2May 11, 2010
Semiconductor device, method for making pattern layout, method for making mask pattern, method for making layout, method for manufacturing photo mask, photo mask, and method for manufacturing semiconductor device
TOSHIBA KK7 citations71
US8373845B2Feb 12, 2013
Exposure control apparatus, manufacturing method of semiconductor device, and exposure apparatus
TOSHIBA KK4 citations63
US7655369B2Feb 2, 2010
Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device
TOSHIBA KK1 citations63
US7368209B2May 6, 2008
Method for evaluating sensitivity of photoresist, method for preparation of photoresist and manufacturing method of semiconductor device
TOSHIBA KK3 citations63
US7365830B2Apr 29, 2008
Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method using the evaluation method, semiconductor device manufacturing method using the evaluation method and semiconductor device manufacturing method using a wafer evaluated by the evaluation method
TOSHIBA KK4 citations63
US7636910B2Dec 22, 2009
Photomask quality estimation system and method for use in manufacturing of semiconductor device, and method for manufacturing the semiconductor device
TOSHIBA KK4 citations62
US7682757B2Mar 23, 2010
Pattern layout for forming integrated circuit
TOSHIBA KK6 citations61
US7855047B2Dec 21, 2010
Reticle set, method for designing a reticle set, exposure monitoring method, inspection method for reticle set and manufacturing method for a semiconductor device
TOSHIBA KK0 citations52
US7426711B2Sep 16, 2008
Mask pattern data forming method, photomask and method of manufacturing semiconductor device
TOSHIBA KK1 citations52
US7794899B2Sep 14, 2010
Photo mask, exposure method using the same, and method of generating data
TOSHIBA KK0 citations51
US7662523B2Feb 16, 2010
Photo mask, exposure method using the same, and method of generating data
TOSHIBA KK0 citations51
US7384712B2Jun 10, 2008
Photo mask, exposure method using the same, and method of generating data
TOSHIBA KK0 citations51
US7585597B2Sep 8, 2009
Mask pattern data generating method, photo mask manufacturing method, and semiconductor device manufacturing method
TOSHIBA KK0 citations42