Inventor
MIMOTOGI SHOJI
JP40 patents
⚠️ This page may combine multiple inventors who share the name “MIMOTOGI SHOJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
36 patentsUS5889678AMar 30, 1999
Topography simulation method
TOSHIBA KK32 citations93
US5889686AMar 30, 1999
Profile simulation method
TOSHIBA KK28 citations93
US6649310B2Nov 18, 2003
Method of manufacturing photomask
TOSHIBA KK26 citations92
US6294297B1Sep 25, 2001
Computer program product for calculating a process tolerance relating exposure amount and focal point position
TOSHIBA KK31 citations92
US7685556B2Mar 23, 2010
Mask data correction method, photomask manufacturing method, computer program, optical image prediction method, resist pattern shape prediction method, and semiconductor device manufacturing method
TOSHIBA KK10 citations84
US7319944B2Jan 15, 2008
Method for a predicting a pattern shape by using an actual measured dissolution rate of a photosensitive resist
TOSHIBA KK11 citations84
US7248349B2Jul 24, 2007
Exposure method for correcting a focal point, and a method for manufacturing a semiconductor device
TOSHIBA KK10 citations84
US7090949B2Aug 15, 2006
Method of manufacturing a photo mask and method of manufacturing a semiconductor device
TOSHIBA KK14 citations84
US8381138B2Feb 19, 2013
Simulation model creating method, computer program product, and method of manufacturing a semiconductor device
TOSHIBA KK8 citations83
US7840390B2Nov 23, 2010
Creating method of simulation model, manufacturing method of photo mask, manufacturing method of semiconductor device, and recording medium
TOSHIBA KK7 citations74
US7596776B2Sep 29, 2009
Light intensity distribution simulation method and computer program product
TOSHIBA KK7 citations74
US7336341B2Feb 26, 2008
Simulator of lithography tool for correcting focus error and critical dimension, simulation method for correcting focus error and critical dimension, and computer medium for storing computer program for simulator
TOSHIBA KK8 citations74
US7148138B2Dec 12, 2006
Method of forming contact hole and method of manufacturing semiconductor device
TOSHIBA KK9 citations74
US6967719B2Nov 22, 2005
Method for inspecting exposure apparatus, exposure method for correcting focal point, and method for manufacturing semiconductor device
TOSHIBA KK6 citations74
US6632592B1Oct 14, 2003
Resist pattern forming method
TOSHIBA KK7 citations74
US6418553B1Jul 9, 2002
Circuit designing method for semiconductor device and computer-readable medium
TOSHIBA KK13 citations74
US6252651B1Jun 26, 2001
Exposure method and exposure apparatus using it
TOSHIBA KK10 citations74
US6249900B1Jun 19, 2001
Method of designing an LSI pattern to be formed on a specimen with a bent portion
TOSHIBA KK11 citations74
US6225033B1May 1, 2001
Method of forming a resist pattern
TOSHIBA KK9 citations74
US6107013AAug 22, 2000
Exposure method and exposure apparatus using it
TOSHIBA KK8 citations74
US5906903AMay 25, 1999
Process tolerance calculating method relating exposure amount and focal point position to allowable dimension value
TOSHIBA KK9 citations74
US5745388AApr 28, 1998
Profile simulation method and pattern design method
TOSHIBA KK12 citations74
US5733687AMar 31, 1998
Photomask, exposing method using photomask, and manufacturing method of photomask
TOSHIBA KK12 citations74
US6045981AApr 4, 2000
Method of manufacturing semiconductor device
TOSHIBA KK9 citations73
US5876885AMar 2, 1999
Profile simulation method, dependent on curvature of processed surface, and mask design method utilizing simulation
TOSHIBA KK7 citations73
US7793252B2Sep 7, 2010
Mask pattern preparation method, semiconductor device manufacturing method and recording medium
TOSHIBA KK3 citations63
US7560197B2Jul 14, 2009
Mask pattern data producing method, patterning method, reticle correcting method, reticle manufacturing method, and semiconductor apparatus manufacturing method
TOSHIBA KK3 citations63
US7636910B2Dec 22, 2009
Photomask quality estimation system and method for use in manufacturing of semiconductor device, and method for manufacturing the semiconductor device
TOSHIBA KK4 citations62
US7229721B2Jun 12, 2007
Method for evaluating photo mask and method for manufacturing semiconductor device
TOSHIBA KK6 citations62
US8055366B2Nov 8, 2011
Simulation model creating method, mask data creating method and semiconductor device manufacturing method
TOSHIBA KK1 citations52
US7426712B2Sep 16, 2008
Lithography simulation method and recording medium
TOSHIBA KK1 citations52
US6988016B2Jan 17, 2006
Method for evaluating lithography process margins
TOSHIBA KK0 citations52
US7912275B2Mar 22, 2011
Method of evaluating a photo mask and method of manufacturing a semiconductor device
TOSHIBA KK0 citations51
US7575835B2Aug 18, 2009
Exposure method, exposure quantity calculating system using the exposure method and semiconductor device manufacturing method using the exposure method
TOSHIBA KK0 citations51
US7118834B2Oct 10, 2006
Exposure method, exposure quantity calculating system using the exposure method and semiconductor device manufacturing method using the exposure method
TOSHIBA KK0 citations51
US7446852B2Nov 4, 2008
Projection exposure mask acceptance decision system, projection exposure mask acceptance decision method, method for manufacturing semiconductor device, and computer program project
TOSHIBA KK1 citations50