Inventor
DOH SEOK-JOO
KR3 patents
Patents
3 patentsUS7494940B2Feb 24, 2009
Post thermal treatment methods of forming high dielectric layers over interfacial layers in integrated circuit devices
SAMSUNG ELECTRONICS CO LTD16 citations92
US7037863B2May 2, 2006
Post thermal treatment methods of forming high dielectric layers over interfacial layers in integrated circuit devices
SAMSUNG ELECTRONICS CO LTD15 citations92
US7586159B2Sep 8, 2009
Semiconductor devices having different gate dielectrics and methods for manufacturing the same
SAMSUNG ELECTRONICS CO LTD13 citations83