Inventor
AHN YO HAN
KR19 patents
⚠️ This page may combine multiple inventors who share the name “AHN YO HAN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SAMSUNG ELECTRONICS CO LTD
17 patentsUS6402598B1Jun 11, 2002
Chemical mechanical polishing apparatus and method of washing contaminants off of the polishing head thereof
SAMSUNG ELECTRONICS CO LTD71 citations96
US7850449B2Dec 14, 2010
Heat treatment equipment
SAMSUNG ELECTRONICS CO LTD466 citations95
US6996453B2Feb 7, 2006
Substrate processing apparatus and method of processing substrate while controlling for contamination in substrate transfer module
SAMSUNG ELECTRONICS CO LTD52 citations90
US7258728B2Aug 21, 2007
Apparatus and method for cleaning air
SAMSUNG ELECTRONICS CO LTD19 citations89
US6036781AMar 14, 2000
Apparatus for guiding air current in a wafer loading chamber for chemical vapor deposition equipment
SAMSUNG ELECTRONICS CO LTD24 citations87
US5856623AJan 5, 1999
Particle counter with sampling probe having adjustable intake area
SAMSUNG ELECTRONICS CO LTD20 citations87
US6370793B1Apr 16, 2002
Apparatus for controlling the temperature of a wafer located at a pre-alignment stage
SAMSUNG ELECTRONICS CO LTD18 citations84
US7065898B2Jun 27, 2006
Module for transferring a substrate
SAMSUNG ELECTRONICS CO LTD19 citations83
US6093229AJul 25, 2000
Drive checking system for fan filter units in clean room
SAMSUNG ELECTRONICS CO LTD19 citations82
US6098023AAug 1, 2000
Driving control system and monitoring device for fan filter unit in semiconductor clean room
SAMSUNG ELECTRONICS CO LTD8 citations72
US6613487B1Sep 2, 2003
Pre-alignment system of exposure apparatus having wafer cooling means and exposure method using the same
SAMSUNG ELECTRONICS CO LTD10 citations71
US6522385B2Feb 18, 2003
Air shower head of photolithography equipment for directing air towards a wafer stage
SAMSUNG ELECTRONICS CO LTD12 citations70
US7326284B2Feb 5, 2008
Contamination control system and air-conditioning system of a substrate processing apparatus using the same
SAMSUNG ELECTRONICS CO LTD2 citations62
US8027017B2Sep 27, 2011
Substrate treating apparatus and exposing apparatus for cleaning a chuck cleaning tool with treating bath
SAMSUNG ELECTRONICS CO LTD5 citations55
US7914594B2Mar 29, 2011
Air filtering device and cleaning system of semiconductor manufacturing apparatus with the same
SAMSUNG ELECTRONICS CO LTD0 citations49
US6737206B2May 18, 2004
Pre-alignment system of exposure apparatus having wafer cooling means and exposure method using the same
SAMSUNG ELECTRONICS CO LTD0 citations49
US7161660B2Jan 9, 2007
Photolithography system and method of monitoring the same
SAMSUNG ELECTRONICS CO LTD0 citations48