Inventor
OKASE WATARU
JP34 patents
⚠️ This page may combine multiple inventors who share the name “OKASE WATARU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
26 patentsUS6497767B1Dec 24, 2002
Thermal processing unit for single substrate
TOKYO ELECTRON LTD398 citations99
US5884009AMar 16, 1999
Substrate treatment system
TOKYO ELECTRON LTD249 citations99
US5862302AJan 19, 1999
Thermal processing apparatus having a reaction tube with transparent and opaque portions
TOKYO ELECTRON LTD362 citations99
US5592581AJan 7, 1997
Heat treatment apparatus
TOKYO ELECTRON LTD131 citations98
US6473993B1Nov 5, 2002
Thermal treatment method and apparatus
TOKYO ELECTRON LTD53 citations96
US5329095AJul 12, 1994
Thermal treatment apparatus utilizing heated lid
TOKYO ELECTRON LTD65 citations96
US5554226ASep 10, 1996
Heat treatment processing apparatus and cleaning method thereof
TOKYO ELECTRON LTD54 citations95
US6121579ASep 19, 2000
Heating apparatus, and processing apparatus
TOKYO ELECTRON LTD81 citations94
US6756565B2Jun 29, 2004
Thermal insulator having a honeycomb structure and heat recycle system using the thermal insulator
TOKYO ELECTRON LTD24 citations92
US6402848B1Jun 11, 2002
Single-substrate-treating apparatus for semiconductor processing system
TOKYO ELECTRON LTD48 citations92
US6399922B2Jun 4, 2002
Single-substrate-heat-treating apparatus for semiconductor process system
TOKYO ELECTRON LTD36 citations92
US6322631B1Nov 27, 2001
Heat treatment method and its apparatus
TOKYO ELECTRON LTD22 citations92
US6228173B1May 8, 2001
Single-substrate-heat-treating apparatus for semiconductor process system
TOKYO ELECTRON LTD38 citations92
US5749723AMay 12, 1998
Heat treatment apparatus
TOKYO ELECTRON LTD27 citations92
US5678989AOct 21, 1997
Heat treatment method using a vertical processing tube
TOKYO ELECTRON LTD19 citations92
US5359148AOct 25, 1994
Heat-treating apparatus
TOKYO ELECTRON LTD36 citations92
US6036482AMar 14, 2000
Heat treatment method
TOKYO ELECTRON LTD15 citations74
US5571010ANov 5, 1996
Heat treatment method and apparatus
TOKYO ELECTRON LTD15 citations74
US6949719B2Sep 27, 2005
Thermal insulator having a honeycomb structure and heat recycle system using the thermal insulator
TOKYO ELECTRON LTD10 citations73
US5427625AJun 27, 1995
Method for cleaning heat treatment processing apparatus
TOKYO ELECTRON LTD9 citations73
US7112268B2Sep 26, 2006
Plating device and plating method
TOKYO ELECTRON LTD3 citations63
US6716329B2Apr 6, 2004
Processing apparatus and processing system
TOKYO ELECTRON LTD6 citations63
US6634370B2Oct 21, 2003
Liquid treatment system and liquid treatment method
TOKYO ELECTRON LTD6 citations60
US6740164B2May 25, 2004
Plating apparatus and method of manufacturing semiconductor device
TOKYO ELECTRON LTD1 citations52
US6641709B2Nov 4, 2003
Mist trap mechanism and method for plating apparatus
TOKYO ELECTRON LTD0 citations51
US6953522B2Oct 11, 2005
Liquid treatment method using alternating electrical contacts
TOKYO ELECTRON LTD0 citations41