P

Inventor

WADA KENJI

JP84 patents
⚠️ This page may combine multiple inventors who share the name “WADA KENJI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

FUJIFILM CORP

20 patents
US8034547B2Oct 11, 2011

Pattern forming method, resist composition to be used in the pattern forming method, negative developing solution to be used in the pattern forming method and rinsing solution for negative development to be used in the pattern forming method

FUJIFILM CORP70 citations98
US8017304B2Sep 13, 2011

Pattern forming method, and resist composition, developer and rinsing solution used in the pattern forming method

FUJIFILM CORP79 citations98
US7449573B2Nov 11, 2008

Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition

FUJIFILM CORP18 citations93
US8053161B2Nov 8, 2011

Resist composition, resin for use in the resist composition, compound for use in the synthesis of the resin, and pattern-forming method using the resist composition

FUJIFILM CORP13 citations84
US7875746B2Jan 25, 2011

Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition

FUJIFILM CORP11 citations84
US7749679B2Jul 6, 2010

Photosensitive composition, pattern-forming method using the photosensitive composition and compounds used in the photosensitive composition

FUJIFILM CORP10 citations84
US7615330B2Nov 10, 2009

Positive resist composition and pattern formation method using the same

FUJIFILM CORP9 citations84
US7524609B2Apr 28, 2009

Photo sensitive composition, pattern-forming method using the photosensitive composition and compound for use in the photosensitive composition

FUJIFILM CORP10 citations84
US7341817B2Mar 11, 2008

Photosensitive composition, compound for use in the photosensitive composition, and pattern forming method using the photosensitive composition

FUJIFILM CORP13 citations84
US10093645B2Oct 9, 2018

Synthetic intermediate of 1-(2-deoxy-2-fluoro-4-thio-β-D-arabinofuranosyl)cytosine, synthetic intermediate of thionucleoside, and method for producing the same

FUJIFILM CORP4 citations83
US9475835B2Oct 25, 2016

Synthetic intermediate of 1-(2-deoxy-2-fluoro-4-thio-β-D-arabinofuranosyl) cytosine, synthetic intermediate of thionucleoside, and method for producing the same

FUJIFILM CORP11 citations83
US9221865B2Dec 29, 2015

Synthetic intermediate of 1-(2-deoxy-2-fluoro-4-thio-β-D-arabinofuranosyl)cytosine, synthetic intermediate of thionucleoside, and method for producing the same

FUJIFILM CORP10 citations83
US7851130B2Dec 14, 2010

Photosensitive composition, compound for use in the photosensitive composition, and pattern-forming method using the photosensitive composition

FUJIFILM CORP13 citations83
US7718344B2May 18, 2010

Resist composition and pattern forming method using the same

FUJIFILM CORP14 citations83
US7691558B2Apr 6, 2010

Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition

FUJIFILM CORP7 citations74
US11332551B2May 17, 2022

Method for manufacturing polymer and flow-type reaction system for manufacturing polymer

FUJIFILM CORP2 citations72
US11242414B2Feb 8, 2022

Method for manufacturing polymer and flow-type reaction system for manufacturing polymer

FUJIFILM CORP2 citations71
US7923199B2Apr 12, 2011

Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition

FUJIFILM CORP6 citations63
US7527911B2May 5, 2009

Photosensitive composition, pattern-forming method using the photosensitive composition and compounds used in the photosensitive composition

FUJIFILM CORP2 citations63
US7351515B2Apr 1, 2008

Positive resist composition and pattern-forming method using the same

FUJIFILM CORP2 citations63

SEIKO EPSON CORP

10 patents

SHARP KK

4 patents

RIKEN LIGHT METAL IND COMPANY

2 patents

HITACHI LTD

2 patents

TSUBAKI HIDEAKI

1 patent

NAT INST OF ADVANCED IND SCIEN

1 patent

FUJI PHOTO FILM CO LTD

1 patent

FUJITSU LTD

1 patent

KAMIMURA SOU

1 patent

NIPPON ZEON CO

1 patent

WADA KENJI

1 patent

TARUTANI SHINJI

1 patent

SAIE TOSHIYUKI

1 patent

MAHLE FILTER SYSTEMS JP CORP

1 patent

KODAMA KUNIHIKO

1 patent

TAKAHASHI HIDENORI

1 patent

Showing the top 50 of 84 patents by PatentIndex Score.