Inventor

WATSON DOUGLAS C

US73 patents

⚠️ This page may combine multiple inventors who share the name “WATSON DOUGLAS C”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

WATSON DOUGLAS C

NIKON CORP

Environmental system including a transport region for an immersion lithography apparatus

Cleanup method for optics in immersion lithography

Sliding seal

Kinematic lens mounting with distributed support and radial flexure

Deformable mirror with high-bandwidth servo for rigid body control

Method and apparatus for compensating for reaction forces in a stage assembly

Environmental system including a transport region for an immersion lithography apparatus

Liquid jet and recovery system for immersion lithography

Environmental system including a transport region for an immersion lithography apparatus

Liquid jet and recovery system for immersion lithography

Compensating for cable drag forces in high precision stages

Kinematic lens mount with reduced clamping force

Deformable mirror with passive and active actuators

Long stroke mover for a stage assembly

Liquid cooled mirror for use in extreme ultraviolet lithography

EUV reticle handling system and method

Multiple system vibration isolator

Vibration isolator with low lateral stiffness

Kinematic optical mounting assembly with flexures

Adaptive optic with discrete actuators for continuous deformation of a deformable mirror system

Modular exposure apparatus with removable optical device and improved isolation of the optical device

Multiple chamber fluid mount

Low stiffness suspension for a stage

Multiple stage, stage assembly having independent stage bases

Static pressure air bearing

Environmental system including a transport region for an immersion lithography apparatus

Fine force actuator assembly for chemical mechanical polishing apparatuses

System and method for holding a device with minimal deformation

Air bearing linear guide for use in a vacuum

Environmental system including a transport region for an immersion lithography apparatus

Environmental system including a transport region for an immersion lithography apparatus

EUV reticle handling system and method

Flexure supported wafer table

Wafer stage carrier and removal assembly

Method of making a static pressure air bearing

Cleanup method for optics in immersion lithography using object on wafer holder in place of wafer

Damper for a stage assembly

Barrier assembly for an exposure apparatus

CI-core actuator for long travel in a transverse direction

Holder mover for a stage assembly

Method and apparatus for cooling power supply wires used to drive stages in electron beam lithography machines

Quick chamber seals

Friction-drive stage

ADAC LAB INC

Apparatus and method for automated collimator exchange

WILLIAMSON DAVID M

High NA catadioptric imaging optics for imaging A reticle to a pair of imaging locations

HASHEMI FARDAD A

System for isolating an exposure apparatus

KAWAI HIDEMI

Cleanup method for optics in immersion lithography using sonic device

NOVAK W THOMAS

Liquid jet and recovery system for immersion lithography

SOGARD MICHAEL R

Temperature-controlled holding devices for planar articles

HASHEMI FARDAD

Vacuum chamber assembly for supporting a workpiece