Inventor
NOVAK W THOMAS
US84 patents
⚠️ This page may combine multiple inventors who share the name “NOVAK W THOMAS”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
NIKON CORP
37 patentsUS7251017B2Jul 31, 2007
Environmental system including a transport region for an immersion lithography apparatus
NIKON CORP65 citations99
US6437463B1Aug 20, 2002
Wafer positioner with planar motor and mag-lev fine stage
NIKON CORP135 citations99
US7522259B2Apr 21, 2009
Cleanup method for optics in immersion lithography
NIKON CORP71 citations98
US6239924B1May 29, 2001
Kinematic lens mounting with distributed support and radial flexure
NIKON CORP94 citations98
US5998889ADec 7, 1999
Electro-magnetic motor cooling system
NIKON CORP97 citations98
US7414794B2Aug 19, 2008
Optical arrangement of autofocus elements for use with immersion lithography
NIKON CORP43 citations96
US5996437ADec 7, 1999
Precision motion stage with single guide beam and follower stage
NIKON CORP62 citations95
US7345742B2Mar 18, 2008
Environmental system including a transport region for an immersion lithography apparatus
NIKON CORP43 citations94
US7932989B2Apr 26, 2011
Liquid jet and recovery system for immersion lithography
NIKON CORP11 citations93
US7929111B2Apr 19, 2011
Environmental system including a transport region for an immersion lithography apparatus
NIKON CORP10 citations93
US7570431B2Aug 4, 2009
Optical arrangement of autofocus elements for use with immersion lithography
NIKON CORP14 citations93
US7443482B2Oct 28, 2008
Liquid jet and recovery system for immersion lithography
NIKON CORP27 citations93
US7397532B2Jul 8, 2008
Run-off path to collect liquid for an immersion lithography apparatus
NIKON CORP34 citations93
US7125128B2Oct 24, 2006
Adaptive-optics actuator arrays and methods for using such arrays
NIKON CORP17 citations93
US6717159B2Apr 6, 2004
Low distortion kinematic reticle support
NIKON CORP41 citations93
US6653639B1Nov 25, 2003
Chuck for mounting reticle to a reticle stage
NIKON CORP27 citations93
US6355993B1Mar 12, 2002
Linear motor having polygonal shaped coil units
NIKON CORP26 citations93
US6880942B2Apr 19, 2005
Adaptive optic with discrete actuators for continuous deformation of a deformable mirror system
NIKON CORP28 citations92
US6674512B2Jan 6, 2004
Interferometer system for a semiconductor exposure system
NIKON CORP25 citations92
US6278203B1Aug 21, 2001
Cooling structure for a linear motor
NIKON CORP42 citations92
US6147421ANov 14, 2000
Platform positionable in at least three degrees of freedom by interaction with coils
NIKON CORP44 citations92
US6781138B2Aug 24, 2004
Positioning stage with stationary actuators
NIKON CORP20 citations91
US6499880B2Dec 31, 2002
Static pressure air bearing
NIKON CORP18 citations90
US9587977B2Mar 7, 2017
Boresight error monitor for laser radar integrated optical assembly
NIKON CORP8 citations84
US7929110B2Apr 19, 2011
Environmental system including a transport region for an immersion lithography apparatus
NIKON CORP7 citations84
US7889207B2Feb 15, 2011
Image apparatus with image noise compensation
NIKON CORP9 citations84
US7720371B2May 18, 2010
Depth layer extraction and image synthesis from focus varied multiple images
NIKON CORP12 citations84
US7172493B2Feb 6, 2007
Fine force actuator assembly for chemical mechanical polishing apparatuses
NIKON CORP14 citations84
US6525802B1Feb 25, 2003
Kinematic mounted reference mirror with provision for stable mounting of alignment optics
NIKON CORP13 citations84
US6467960B1Oct 22, 2002
Air bearing linear guide for use in a vacuum
NIKON CORP16 citations84
US6753534B2Jun 22, 2004
Positioning stage with stationary and movable magnet tracks
NIKON CORP19 citations82
US6597435B2Jul 22, 2003
Reticle stage with reaction force cancellation
NIKON CORP17 citations77
US8018657B2Sep 13, 2011
Optical arrangement of autofocus elements for use with immersion lithography
NIKON CORP4 citations74
US7969552B2Jun 28, 2011
Environmental system including a transport region for an immersion lithography apparatus
NIKON CORP5 citations74
US7965376B2Jun 21, 2011
Environmental system including a transport region for an immersion lithography apparatus
NIKON CORP3 citations74
US7572019B2Aug 11, 2009
Adaptive-optics actuator arrays and methods for using such arrays
NIKON CORP5 citations74
US7333179B2Feb 19, 2008
Moving mechanism with high bandwidth response and low force transmissibility
NIKON CORP7 citations74
MICRONIX PARTNERS
3 patentsNIPPON KOGAKU KK
3 patentsUS6134981AOct 24, 2000
Precision scanning apparatus and method with fixed and movable guide members
NIPPON KOGAKU KK67 citations95
USRE41232EApr 20, 2010
Wafer positioner with planar motor and mag-lev fine stage
NIPPON KOGAKU KK15 citations84
USH2114HFeb 1, 2005
Inspection tool for testing and adjusting a projection unit of a lithography system
NIPPON KOGAKU KK16 citations84
NIKON PRECISION INC
2 patentsMICRONIX CORP
2 patentsNIKON CORP OF JAPAN
1 patentNIKON CORP JAPAN
1 patentKAWAI HIDEMI
1 patentShowing the top 50 of 84 patents by PatentIndex Score.