Inventor
OZAWA KEN
JP55 patents
⚠️ This page may combine multiple inventors who share the name “OZAWA KEN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
SONY CORP
18 patentsUS10461106B2Oct 29, 2019
Imaging element and camera system
SONY CORP6 citations84
US9294697B2Mar 22, 2016
Imaging apparatus and camera system
SONY CORP8 citations84
US9523803B2Dec 20, 2016
Image capturing element and image capturing apparatus for removing infrared components from light
SONY CORP4 citations73
US11054304B2Jul 6, 2021
Imaging device and method
SONY CORP1 citations63
US11031423B2Jun 8, 2021
Imaging element and camera system
SONY CORP0 citations63
US7525733B2Apr 28, 2009
Solid-state imaging device and method for manufacturing the same
SONY CORP2 citations63
US7438996B2Oct 21, 2008
Mask correcting method
SONY CORP4 citations63
US9888193B2Feb 6, 2018
Imaging apparatus and camera system
SONY CORP1 citations62
US9432598B2Aug 30, 2016
Imaging apparatus and camera system
SONY CORP2 citations62
US7379639B2May 27, 2008
Lens assembly and electronic apparatus using the same
SONY CORP6 citations57
US10491841B2Nov 26, 2019
Imaging apparatus and camera system with optical member
SONY CORP0 citations52
US10264198B2Apr 16, 2019
Imaging apparatus and camera system for improving image quality
SONY CORP0 citations52
US9736407B2Aug 15, 2017
Imaging apparatus and camera system with light-transmitting laminated material
SONY CORP0 citations52
US9670532B2Jun 6, 2017
Chemical sensor, chemical sensor module, biomolecule detection apparatus, and biomolecule detection method
SONY CORP0 citations52
US9648259B2May 9, 2017
Imaging apparatus and camera system for improving image quality
SONY CORP0 citations52
US7879513B2Feb 1, 2011
Method for correcting mask
SONY CORP0 citations52
US7655377B2Feb 2, 2010
Antireflection film and exposure method
SONY CORP2 citations48
US7473494B2Jan 6, 2009
Exposure mask and mask pattern production method
SONY CORP1 citations47
NIKON CORP
14 patentsUS5534970AJul 9, 1996
Scanning exposure apparatus
NIKON CORP200 citations98
US5728495AMar 17, 1998
Scanning exposure method and apparatus
NIKON CORP68 citations96
US5473412ADec 5, 1995
Energy amount controlling method
NIKON CORP57 citations96
US6730925B1May 4, 2004
Method and apparatus for projection exposure and device manufacturing method
NIKON CORP40 citations93
US6721039B2Apr 13, 2004
Exposure method, exposure apparatus and device producing method
NIKON CORP45 citations93
US6501535B1Dec 31, 2002
Exposure control method and apparatus
NIKON CORP22 citations93
US6154270ANov 28, 2000
Scanning exposure method and apparatus
NIKON CORP26 citations93
US6124064ASep 26, 2000
Light exposure controlling method
NIKON CORP23 citations93
US5929977AJul 27, 1999
Exposure apparatus and exposure quantity control method
NIKON CORP31 citations93
US5898480AApr 27, 1999
Exposure method
NIKON CORP21 citations93
US5659383AAug 19, 1997
Exposure apparatus and exposure quantity control method
NIKON CORP30 citations93
US5574537ANov 12, 1996
Apparatus for controlling light quantity using acousto-optic modulator for selecting 0th-order diffracted beam
NIKON CORP32 citations93
US6538723B2Mar 25, 2003
Scanning exposure in which an object and pulsed light are moved relatively, exposing a substrate by projecting a pattern on a mask onto the substrate with pulsed light from a light source, light sources therefor, and methods of manufacturing
NIKON CORP30 citations92
US6154269ANov 28, 2000
Method of evaluating performance of a scan-type exposure apparatus
NIKON CORP6 citations74
OZAWA KEN
4 patentsUS9064763B2Jun 23, 2015
Solid-state imaging element, solid-state imaging device, imaging apparatus, and method of manufacturing polarizing element
OZAWA KEN16 citations82
US9817485B2Nov 14, 2017
Display control device, method, and program
OZAWA KEN5 citations72
US8675282B2Mar 18, 2014
Solid-state imaging device and method for manufacturing the same
OZAWA KEN4 citations72
US8092960B2Jan 10, 2012
Exposing mask and production method therefor and exposing method
OZAWA KEN2 citations62
SAMSUNG ELECTRONICS CO LTD
4 patentsUS10955360B2Mar 23, 2021
Structured illumination-based inspection apparatus and inspection method, and semiconductor device fabrication method including structured illumination-based inspection method
SAMSUNG ELECTRONICS CO LTD2 citations71
US10429315B2Oct 1, 2019
Imaging apparatus and imaging method
SAMSUNG ELECTRONICS CO LTD1 citations59
US11733176B2Aug 22, 2023
Inspection device and method of measuring wavefront aberration
SAMSUNG ELECTRONICS CO LTD0 citations52
US12560792B2Feb 24, 2026
Polarized microscope and intra image field correction analysis method
SAMSUNG ELECTRONICS CO LTD0 citations48
RENESAS ELECTRONICS CORP
3 patentsNEC ELECTRONICS CORP
3 patentsUS7199042B2Apr 3, 2007
Semiconductor device with multi-layered wiring arrangement including reinforcing patterns, and production method for manufacturing such semiconductor device
NEC ELECTRONICS CORP10 citations84
US6924206B2Aug 2, 2005
Method of manufacturing a semiconductor capacitive element in a semiconductor device
NEC ELECTRONICS CORP7 citations74
US6849920B2Feb 1, 2005
Semiconductor capacitive element, method for manufacturing same and semiconductor device provided with same
NEC ELECTRONICS CORP3 citations63
NIPPON KOGAKU KK
2 patentsOZAWA R & D INC
2 patentsShowing the top 50 of 55 patents by PatentIndex Score.