Inventor
DENISON MARK D
US7 patents
Patents
7 patentsUS6107425AAug 22, 2000
Narrow molecular weight distribution polymers and use of same as resin binders for negative-acting photoresists
SHIPLEY CO LLC24 citations92
US5731386AMar 24, 1998
Polymer for positive acid catalyzed resists
SHIPLEY CO LLC18 citations92
US5827634AOct 27, 1998
Positive acid catalyzed resists
SHIPLEY CO LLC14 citations73
US5541263AJul 30, 1996
Polymer having inert blocking groups
SHIPLEY CO LLC18 citations72
US5514520AMay 7, 1996
Radiation sensitive composition comprising polymer having inert blocking groups
SHIPLEY CO LLC14 citations72
US5700624ADec 23, 1997
Positive acid catalyzed resists having an alkali soluble resin with acid labile groups and inert blocking groups
SHIPLEY CO LLC4 citations62
US5763536AJun 9, 1998
Polymer for positive acid catalyzed resists
SHIPLEY CO LLC0 citations51