Inventor

RYU JIN-A

KR7 patents

⚠️ This page may combine multiple inventors who share the name “RYU JIN-A”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SAMSUNG ELECTRONICS CO LTD

6 patents

US6838223B2Jan 4, 2005

Compositions for anti-reflective light absorbing layer and method for forming patterns in semiconductor device using the same

SAMSUNG ELECTRONICS CO LTD16 citations82

US7026497B2Apr 11, 2006

Adhesive compound and method for forming photoresist pattern using the same

SAMSUNG ELECTRONICS CO LTD3 citations61

US7964332B2Jun 21, 2011

Methods of forming a pattern of a semiconductor device

SAMSUNG ELECTRONICS CO LTD3 citations60

US7442489B2Oct 28, 2008

Photoresist composition and method of forming a photoresist pattern using the same

SAMSUNG ELECTRONICS CO LTD0 citations51

US9528949B2Dec 27, 2016

Methods of detecting inhomogeneity of a layer and apparatus for performing the same

SAMSUNG ELECTRONICS CO LTD1 citations50

US10712662B2Jul 14, 2020

Methods of forming patterns using compositions for an underlayer of photoresist

SAMSUNG ELECTRONICS CO LTD0 citations36

YUN HYO-JIN

1 patent

US8871423B2Oct 28, 2014

Photoresist composition for fabricating probe array, method of fabricating probe array using the photoresist composition, composition for photosensitive type developed bottom anti-reflective coating, fabricating method of patterns using the same and fabricating method of semiconductor device using the same

YUN HYO-JIN6 citations66