Inventor
MITROVIC ANDREJ S
US23 patents
Patents
23 patentsUS6962664B2Nov 8, 2005
Controlled method for segmented electrode apparatus and method for plasma processing
TOKYO ELECTRON LTD71 citations98
US6863020B2Mar 8, 2005
Segmented electrode apparatus for plasma processing
TOKYO ELECTRON LTD93 citations98
US7164236B2Jan 16, 2007
Method and apparatus for improved plasma processing uniformity
TOKYO ELECTRON LTD66 citations97
US6917204B2Jul 12, 2005
Addition of power at selected harmonics of plasma processor drive frequency
TOKYO ELECTRON LTD65 citations95
US8014991B2Sep 6, 2011
System and method for using first-principles simulation to characterize a semiconductor manufacturing process
TOKYO ELECTRON LTD24 citations92
US7591923B2Sep 22, 2009
Apparatus and method for use of optical system with a plasma processing system
TOKYO ELECTRON LTD31 citations92
US6958484B2Oct 25, 2005
Method and apparatus for 2-d spatially resolved optical emission and absorption spectroscopy
TOKYO ELECTRON LTD19 citations92
US6812646B2Nov 2, 2004
Method and device for attenuating harmonics in semiconductor plasma processing systems
TOKYO ELECTRON LTD26 citations92
US6806653B2Oct 19, 2004
Method and structure to segment RF coupling to silicon electrode
TOKYO ELECTRON LTD33 citations92
US8050900B2Nov 1, 2011
System and method for using first-principles simulation to provide virtual sensors that facilitate a semiconductor manufacturing process
TOKYO ELECTRON LTD12 citations84
US8032348B2Oct 4, 2011
System and method for using first-principles simulation to facilitate a semiconductor manufacturing process
TOKYO ELECTRON LTD13 citations84
US7241397B2Jul 10, 2007
Honeycomb optical window deposition shield and method for a plasma processing system
TOKYO ELECTRON LTD16 citations83
US6700458B2Mar 2, 2004
Device and method for coupling two circuit components which have different impedances
TOKYO ELECTRON LTD16 citations79
US7789963B2Sep 7, 2010
Chuck pedestal shield
TOKYO ELECTRON LTD7 citations74
US7233878B2Jun 19, 2007
Method and system for monitoring component consumption
TOKYO ELECTRON LTD7 citations74
US7208067B2Apr 24, 2007
Method and system for monitoring RF impedance to determine conditions of a wafer on an electrostatic chuck
TOKYO ELECTRON LTD8 citations74
US7015414B2Mar 21, 2006
Method and apparatus for determining plasma impedance
TOKYO ELECTRON LTD9 citations74
US6824363B2Nov 30, 2004
Linear inductive plasma pump for process reactors
TOKYO ELECTRON LTD11 citations74
US6729850B2May 4, 2004
Applied plasma duct system
TOKYO ELECTRON LTD8 citations72
US6899527B2May 31, 2005
Closed-drift hall effect plasma vacuum pump for process reactors
TOKYO ELECTRON LTD10 citations71
US7353141B2Apr 1, 2008
Method and system for monitoring component consumption
TOKYO ELECTRON LTD3 citations63
US7186313B2Mar 6, 2007
Plasma chamber wall segment temperature control
TOKYO ELECTRON LTD2 citations62
US6965287B2Nov 15, 2005
Low reflection microwave window
TOKYO ELECTRON LTD1 citations52