Inventor
MURAKI MASATO
JP95 patents
⚠️ This page may combine multiple inventors who share the name “MURAKI MASATO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
CANON KK
47 patentsUS6229647B1May 8, 2001
Reflection and refraction optical system and projection exposure apparatus using the same
CANON KK132 citations99
US6323499B1Nov 27, 2001
Electron beam exposure apparatus and method, and device manufacturing method
CANON KK106 citations98
US6137113AOct 24, 2000
Electron beam exposure method and apparatus
CANON KK94 citations98
US6107636AAug 22, 2000
Electron beam exposure apparatus and its control method
CANON KK92 citations98
US5905267AMay 18, 1999
Electron beam exposure apparatus and method of controlling same
CANON KK113 citations98
US5864142AJan 26, 1999
Electron beam exposure apparatus and method of controlling same
CANON KK108 citations98
US5834783ANov 10, 1998
Electron beam exposure apparatus and method, and device manufacturing method
CANON KK143 citations98
US5463497AOct 31, 1995
Illumination device including an optical integrator defining a plurality of secondary light sources and related method
CANON KK166 citations98
US5182455AJan 26, 1993
Method of detecting relative positional deviation between two objects
CANON KK116 citations98
US5153773AOct 6, 1992
Illumination device including amplitude-division and beam movements
CANON KK214 citations98
US4974919ADec 4, 1990
Illuminating device
CANON KK191 citations98
US7126141B2Oct 24, 2006
Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method
CANON KK38 citations96
US6965153B1Nov 15, 2005
Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method
CANON KK62 citations96
US6835937B1Dec 28, 2004
Correcting method for correcting exposure data used for a charged particle beam exposure system
CANON KK67 citations96
US6124599ASep 26, 2000
Electron beam exposure system and method of manufacturing devices using the same
CANON KK71 citations96
US5981954ANov 9, 1999
Electron beam exposure apparatus
CANON KK83 citations96
US5929454AJul 27, 1999
Position detection apparatus, electron beam exposure apparatus, and methods associated with them
CANON KK71 citations96
US5726740AMar 10, 1998
Projection exposure apparatus having illumination device with ring-like or spot-like light source
CANON KK48 citations96
US5715084AFeb 3, 1998
Reflection and refraction optical system and projection exposure apparatus using the same
CANON KK67 citations96
US5345292ASep 6, 1994
Illumination device for projection exposure apparatus
CANON KK98 citations96
US5117254AMay 26, 1992
Projection exposure apparatus
CANON KK61 citations96
US4947047AAug 7, 1990
Exposure system with exposure controlling acoustooptic element
CANON KK53 citations96
US6166387ADec 26, 2000
Electron beam exposure apparatus and method
CANON KK65 citations95
US5973332AOct 26, 1999
Electron beam exposure method, and device manufacturing method using same
CANON KK73 citations95
US7692166B2Apr 6, 2010
Charged particle beam exposure apparatus
CANON KK47 citations94
US7005658B2Feb 28, 2006
Charged particle beam exposure apparatus and method
CANON KK47 citations93
US6864488B2Mar 8, 2005
Charged particle beam exposure method and apparatus
CANON KK19 citations93
US6657210B1Dec 2, 2003
Electron beam exposure method, a method of constructing exposure control data, and a computer-readable medium
CANON KK29 citations93
US6636349B2Oct 21, 2003
Reflection and refraction optical system and projection exposure apparatus using the same
CANON KK17 citations93
US6583430B1Jun 24, 2003
Electron beam exposure method and apparatus
CANON KK30 citations93
US6566664B2May 20, 2003
Charged-particle beam exposure apparatus and device manufacturing method
CANON KK53 citations93
US6559456B1May 6, 2003
Charged particle beam exposure method and apparatus
CANON KK42 citations93
US6552353B1Apr 22, 2003
Multi-electron beam exposure method and apparatus and device manufacturing method
CANON KK37 citations93
US6472672B1Oct 29, 2002
Electron beam exposure apparatus and its control method
CANON KK28 citations93
US6337485B1Jan 8, 2002
Electron beam exposure apparatus and its control method
CANON KK19 citations93
US6274877B1Aug 14, 2001
Electron beam exposure apparatus
CANON KK43 citations93
US6104035AAug 15, 2000
Electron-beam exposure apparatus and method
CANON KK45 citations93
US5939725AAug 17, 1999
Electron beam exposure apparatus
CANON KK52 citations93
US5499076AMar 12, 1996
Exposure method and apparatus
CANON KK22 citations93
US5363170ANov 8, 1994
Illumination device and projection exposure apparatus using the same
CANON KK49 citations93
US6969862B2Nov 29, 2005
Charged-particle-beam exposure apparatus and method of controlling same
CANON KK19 citations92
US6919574B2Jul 19, 2005
Electron beam exposure apparatus, deflection apparatus, and electron beam exposure method
CANON KK35 citations92
US6917045B2Jul 12, 2005
Electron beam exposure apparatus, electron beam exposure apparatus calibration method, and semiconductor element manufacturing method
CANON KK28 citations92
US6870171B2Mar 22, 2005
Exposure apparatus
CANON KK32 citations92
US6818911B2Nov 16, 2004
Array structure and method of manufacturing the same, charged particle beam exposure apparatus, and device manufacturing method
CANON KK46 citations92
US6784442B2Aug 31, 2004
Exposure apparatus, control method thereof, and device manufacturing method
CANON KK23 citations92
US6515409B2Feb 4, 2003
Charged-particle beam exposure apparatus, exposure system, control method therefor, and device manufacturing method
CANON KK39 citations92
MURAKI MASATO
1 patentADVANTEST CORP
1 patentHITACHI LTD
1 patentShowing the top 50 of 95 patents by PatentIndex Score.