Inventor

SCHUSTER KARL-HEINZ

DE105 patents

⚠️ This page may combine multiple inventors who share the name “SCHUSTER KARL-HEINZ”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

SCHUSTER KARL-HEINZ

ZEISS CARL SMT AG

Very high-aperture projection objective

Refractive projection objective

Method for focus detection for optically detecting deviation of the image plane of a projection lens from the upper surface of a substrate, and an imaging system with a focus-detection system

Method for optically detecting deviations of an image plane of an imaging system from the surface of a substrate

Refractive projection objective

Very-high aperture projection objective

Projection exposure method and projection exposure system

Refractive projection objective with a waist

Polarizer and microlithography projection system with a polarizer

Projection exposure system for microlithography and method for generating microlithographic images

Projection objective for immersion lithography

Objectives as a microlithography projection objective with at least one liquid lens

Projection exposure machine comprising a projection lens

Illumination system particularly for microlithography

Projection objective for microlithography

Microlithographic projection exposure apparatus

Optically polarizing retardation arrangement, and a microlithography projection exposure machine

Projection exposure system for microlithography and method for generating microlithographic images

Optically polarizing retardation arrangement, and microlithography projection exposure machine

Projection exposure system

Illumination system for a wavelength of ≦ 193 nm, with sensors for determining an illumination

ZEISS STIFTUNG

Illumination system particularly for microlithography

Radial polarization-rotating optical arrangement and microlithographic projection exposure system incorporating said arrangement

Optical system with polarization compensator

Illumination system particularly for EUV lithography

Radial polarization-rotating optical arrangement and microlithographic projection exposure system incorporating said arrangement

Catadioptric objective comprising two intermediate images

Projection exposure system and an exposure method in microlithography

Catadioptric microlithographic reduction objective

Radial polarization-rotating optical arrangement and microlithographic projection exposure system incorporating said arrangement

Catadioptric objective

Optical arrangement

Catadioptric optical system and exposure apparatus having the same

Microlithographic reduction objective, projection exposure equipment and process

Double-refracting planar plate arrangement and deep ultraviolet λ/4-plate

Optical system for the vacuum ultraviolet

Projection objective

Reticular objective for microlithography-projection exposure installations

Apochromatic wide-angle objective

Optical arrangement

Method for evaluating interferograms and interferometer therefor

ZEISS CARL SEMICONDUCTOR MFG

Projection objective having adjacently mounted aspheric lens surfaces

Lithographic objective having a first lens group including only lenses having a positive refractive power

SCHUSTER KARL-HEINZ

Very high-aperture projection objective

CARL ZEISS SMT A G

Very-high aperture projection objective

(unassigned)

Objective, in particular an objective for a semiconductor lithography projection exposure machine, and a production method

ZEISS CARL

Objective with crystal lenses and projection exposure equipment for microlithography

BEDER SUSANNE

Projection objective having a high aperture and a planar end surface

CARL ZEISS SMT

Projection objective

ZEISS CARL SMT GMBH

Illumination system particularly for microlithography