Inventor
WALTHER STEVEN R
US31 patents
⚠️ This page may combine multiple inventors who share the name “WALTHER STEVEN R”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
VARIAN SEMICONDUCTOR EQUIPMENT
20 patentsUS6323497B1Nov 27, 2001
Method and apparatus for controlling ion implantation during vacuum fluctuation
VARIAN SEMICONDUCTOR EQUIPMENT73 citations96
US7820460B2Oct 26, 2010
Patterned assembly for manufacturing a solar cell and a method thereof
VARIAN SEMICONDUCTOR EQUIPMENT37 citations95
US7544957B2Jun 9, 2009
Non-uniform ion implantation
VARIAN SEMICONDUCTOR EQUIPMENT19 citations92
US6716727B2Apr 6, 2004
Methods and apparatus for plasma doping and ion implantation in an integrated processing system
VARIAN SEMICONDUCTOR EQUIPMENT39 citations92
US6686598B1Feb 3, 2004
Wafer clamping apparatus and method
VARIAN SEMICONDUCTOR EQUIPMENT21 citations92
US6521895B1Feb 18, 2003
Wide dynamic range ion beam scanners
VARIAN SEMICONDUCTOR EQUIPMENT33 citations92
US7935942B2May 3, 2011
Technique for low-temperature ion implantation
VARIAN SEMICONDUCTOR EQUIPMENT16 citations91
US7132672B2Nov 7, 2006
Faraday dose and uniformity monitor for plasma based ion implantation
VARIAN SEMICONDUCTOR EQUIPMENT21 citations90
US7396746B2Jul 8, 2008
Methods for stable and repeatable ion implantation
VARIAN SEMICONDUCTOR EQUIPMENT39 citations87
US7342240B2Mar 11, 2008
Ion beam current monitoring
VARIAN SEMICONDUCTOR EQUIPMENT9 citations84
US7675730B2Mar 9, 2010
Techniques for detecting wafer charging in a plasma processing system
VARIAN SEMICONDUCTOR EQUIPMENT8 citations79
USRE40008EJan 22, 2008
Method and apparatus for controlling ion implantation during vacuum fluctuation
VARIAN SEMICONDUCTOR EQUIPMENT7 citations74
US7820527B2Oct 26, 2010
Cleave initiation using varying ion implant dose
VARIAN SEMICONDUCTOR EQUIPMENT2 citations62
US7615748B2Nov 10, 2009
Outgassing rate detection
VARIAN SEMICONDUCTOR EQUIPMENT2 citations60
US7993698B2Aug 9, 2011
Techniques for temperature controlled ion implantation
VARIAN SEMICONDUCTOR EQUIPMENT5 citations57
US7939424B2May 10, 2011
Wafer bonding activated by ion implantation
VARIAN SEMICONDUCTOR EQUIPMENT1 citations51
US7638781B2Dec 29, 2009
Local pressure sensing in a plasma processing system
VARIAN SEMICONDUCTOR EQUIPMENT0 citations50
US7378335B2May 27, 2008
Plasma implantation of deuterium for passivation of semiconductor-device interfaces
VARIAN SEMICONDUCTOR EQUIPMENT1 citations50
US7544959B2Jun 9, 2009
In situ surface contamination removal for ion implanting
VARIAN SEMICONDUCTOR EQUIPMENT0 citations49
US7820987B2Oct 26, 2010
Predicting dose repeatability in an ion implantation
VARIAN SEMICONDUCTOR EQUIPMENT0 citations48
WALTHER STEVEN R
3 patentsUS8339024B2Dec 25, 2012
Methods and apparatuses for reducing heat on an emitter exit window
WALTHER STEVEN R3 citations60
US12290697B2May 6, 2025
Process control for atmospheric plasma treatment of surfaces
WALTHER STEVEN R0 citations50
US8766523B2Jul 1, 2014
Electron beam exit window in electron beam emitter and method for forming the same
WALTHER STEVEN R0 citations49