Inventor
RIGGS DANIEL JASON
US14 patents
⚠️ This page may combine multiple inventors who share the name “RIGGS DANIEL JASON”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
ASML NETHERLANDS BV
11 patentsUS9820368B2Nov 14, 2017
Target expansion rate control in an extreme ultraviolet light source
ASML NETHERLANDS BV5 citations83
US9713240B2Jul 18, 2017
Stabilizing EUV light power in an extreme ultraviolet light source
ASML NETHERLANDS BV7 citations83
US9426872B1Aug 23, 2016
System and method for controlling source laser firing in an LPP EUV light source
ASML NETHERLANDS BV9 citations83
US11096266B2Aug 17, 2021
Target expansion rate control in an extreme ultraviolet light source
ASML NETHERLANDS BV2 citations72
US10674591B2Jun 2, 2020
Target expansion rate control in an extreme ultraviolet light source
ASML NETHERLANDS BV1 citations72
US10314153B2Jun 4, 2019
Target expansion rate control in an extreme ultraviolet light source
ASML NETHERLANDS BV2 citations72
US9980359B2May 22, 2018
Systems and methods for controlling EUV energy generation using pulse intensity
ASML NETHERLANDS BV4 citations72
US9536631B1Jan 3, 2017
Systems and methods to avoid instability conditions in a source plasma chamber
ASML NETHERLANDS BV3 citations72
US9755396B1Sep 5, 2017
EUV LPP source with improved dose control by combining pulse modulation and pulse control mode
ASML NETHERLANDS BV4 citations70
US12174550B2Dec 24, 2024
Calibration system for an extreme ultraviolet light source
ASML NETHERLANDS BV1 citations56
US9832854B2Nov 28, 2017
Systems and methods for stabilization of droplet-plasma interaction via laser energy modulation
ASML NETHERLANDS BV0 citations41