Inventor
HARA MASAMICHI
JP35 patents
⚠️ This page may combine multiple inventors who share the name “HARA MASAMICHI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
19 patentsUS7959985B2Jun 14, 2011
Method of integrating PEALD Ta-containing films into Cu metallization
TOKYO ELECTRON LTD61 citations98
US7459396B2Dec 2, 2008
Method for thin film deposition using multi-tray film precursor evaporation system
TOKYO ELECTRON LTD25 citations92
US7332426B2Feb 19, 2008
Substrate processing method and fabrication process of a semiconductor device
TOKYO ELECTRON LTD18 citations92
US9896761B2Feb 20, 2018
Trap assembly in film forming apparatus
TOKYO ELECTRON LTD15 citations84
US7708835B2May 4, 2010
Film precursor tray for use in a film precursor evaporation system and method of using
TOKYO ELECTRON LTD12 citations83
US7638002B2Dec 29, 2009
Multi-tray film precursor evaporation system and thin film deposition system incorporating same
TOKYO ELECTRON LTD14 citations83
US7484315B2Feb 3, 2009
Replaceable precursor tray for use in a multi-tray solid precursor delivery system
TOKYO ELECTRON LTD18 citations83
US7488512B2Feb 10, 2009
Method for preparing solid precursor tray for use in solid precursor evaporation system
TOKYO ELECTRON LTD15 citations81
US10468237B2Nov 5, 2019
Substrate processing apparatus
TOKYO ELECTRON LTD3 citations73
US10049860B2Aug 14, 2018
Substrate processing apparatus
TOKYO ELECTRON LTD4 citations73
US9673078B2Jun 6, 2017
Cooling processing apparatus and method for operating the same
TOKYO ELECTRON LTD2 citations73
US9303788B2Apr 5, 2016
Load lock device
TOKYO ELECTRON LTD4 citations72
US11862488B2Jan 2, 2024
Substrate stage
TOKYO ELECTRON LTD2 citations68
US8349283B2Jan 8, 2013
Metal recovery method, metal recovery apparatus, gas exhaust system and film forming device using same
TOKYO ELECTRON LTD4 citations63
US7772111B2Aug 10, 2010
Substrate processing method and fabrication process of a semiconductor device
TOKYO ELECTRON LTD2 citations63
US12392033B2Aug 19, 2025
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD0 citations60
US9976217B2May 22, 2018
Film forming method using reversible decomposition reaction
TOKYO ELECTRON LTD1 citations52
US8034406B2Oct 11, 2011
Integrated substrate processing in a vacuum processing tool
TOKYO ELECTRON LTD0 citations52
US11862439B2Jan 2, 2024
Substrate processing apparatus and charge neutralization method for mounting table
TOKYO ELECTRON LTD0 citations45
HARA MASAMICHI
5 patentsUS9404180B2Aug 2, 2016
Deposition device
HARA MASAMICHI6 citations71
US9202728B2Dec 1, 2015
Substrate mounting mechanism, and substrate processing apparatus
HARA MASAMICHI2 citations61
US8518181B2Aug 27, 2013
Film forming apparatus and film forming method
HARA MASAMICHI2 citations61
US9062374B2Jun 23, 2015
Method for film formation, apparatus for film formation, and computer-readable recording medium
HARA MASAMICHI0 citations51
US8273409B2Sep 25, 2012
Method for film formation, apparatus for film formation, and computer-readable recording medium
HARA MASAMICHI0 citations51
GOMI ATSUSHI
3 patentsUS8992686B2Mar 31, 2015
Mounting table structure, film forming apparatus and raw material recovery method
GOMI ATSUSHI3 citations60
US8277889B2Oct 2, 2012
Film formation method and film formation apparatus
GOMI ATSUSHI2 citations60
US8408025B2Apr 2, 2013
Raw material recovery method and trapping mechanism for recovering raw material
GOMI ATSUSHI0 citations50