Inventor
NAGAI TAKAMITSU
JP22 patents
⚠️ This page may combine multiple inventors who share the name “NAGAI TAKAMITSU”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
14 patentsUS6992290B2Jan 31, 2006
Electron beam inspection system and inspection method and method of manufacturing devices using the system
TOSHIBA KK97 citations98
US6265719B1Jul 24, 2001
Inspection method and apparatus using electron beam
TOSHIBA KK121 citations98
US6259094B1Jul 10, 2001
Electron beam inspection method and apparatus
TOSHIBA KK92 citations98
US7973281B2Jul 5, 2011
Semiconductor substrate, substrate inspection method, semiconductor device manufacturing method, and inspection apparatus
TOSHIBA KK57 citations96
US7573066B2Aug 11, 2009
Semiconductor substrate, substrate inspection method, semiconductor device manufacturing method, and inspection apparatus
TOSHIBA KK59 citations96
US7241993B2Jul 10, 2007
Inspection system by charged particle beam and method of manufacturing devices using the system
TOSHIBA KK54 citations96
US6563114B1May 13, 2003
Substrate inspecting system using electron beam and substrate inspecting method using electron beam
TOSHIBA KK103 citations96
US5371371ADec 6, 1994
Magnetic immersion field emission electron gun systems capable of reducing aberration of electrostatic lens
TOSHIBA KK67 citations96
US5444256AAug 22, 1995
Electrostatic lens and method for producing the same
TOSHIBA KK29 citations92
US7302091B2Nov 27, 2007
Method and apparatus for determining defect detection sensitivity data, control method of defect detection apparatus, and method and apparatus for detecting defect of semiconductor devices
TOSHIBA KK14 citations83
US7211796B2May 1, 2007
Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor device
TOSHIBA KK6 citations74
US5535508AJul 16, 1996
Method for producing an electrostatic lens
TOSHIBA KK8 citations74
US7462829B2Dec 9, 2008
Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor device
TOSHIBA KK4 citations63
US7847250B2Dec 7, 2010
Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor device
TOSHIBA KK0 citations52
EBARA CORP
7 patentsUS9368314B2Jun 14, 2016
Inspection system by charged particle beam and method of manufacturing devices using the system
EBARA CORP38 citations98
US8053726B2Nov 8, 2011
Inspection system by charged particle beam and method of manufacturing devices using the system
EBARA CORP11 citations93
US7569838B2Aug 4, 2009
Electron beam inspection system and inspection method and method of manufacturing devices using the system
EBARA CORP23 citations93
US7411191B2Aug 12, 2008
Inspection system by charged particle beam and method of manufacturing devices using the system
EBARA CORP20 citations93
US7351969B2Apr 1, 2008
Electron beam inspection system and inspection method and method of manufacturing devices using the system
EBARA CORP37 citations93
US8803103B2Aug 12, 2014
Inspection system by charged particle beam and method of manufacturing devices using the system
EBARA CORP6 citations84
US8368031B2Feb 5, 2013
Inspection system by charged particle beam and method of manufacturing devices using the system
EBARA CORP3 citations74