Inventor
MIYOSHI MOTOSUKE
JP48 patents
⚠️ This page may combine multiple inventors who share the name “MIYOSHI MOTOSUKE”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOSHIBA KK
42 patentsUS5576833ANov 19, 1996
Wafer pattern defect detection method and apparatus therefor
TOSHIBA KK176 citations99
US6563308B2May 13, 2003
Eddy current loss measuring sensor, thickness measuring system, thickness measuring method, and recorded medium
TOSHIBA KK144 citations98
US6265719B1Jul 24, 2001
Inspection method and apparatus using electron beam
TOSHIBA KK121 citations98
US6259094B1Jul 10, 2001
Electron beam inspection method and apparatus
TOSHIBA KK92 citations98
US6038018AMar 14, 2000
Substrate inspecting apparatus, substrate inspecting system having the same apparatus and substrate inspecting method
TOSHIBA KK124 citations98
US5429730AJul 4, 1995
Method of repairing defect of structure
TOSHIBA KK114 citations97
US6563114B1May 13, 2003
Substrate inspecting system using electron beam and substrate inspecting method using electron beam
TOSHIBA KK103 citations96
US5639699AJun 17, 1997
Focused ion beam deposition using TMCTS
TOSHIBA KK62 citations96
US5399860AMar 21, 1995
Electron optic column and scanning electron microscope
TOSHIBA KK52 citations96
US5371371ADec 6, 1994
Magnetic immersion field emission electron gun systems capable of reducing aberration of electrostatic lens
TOSHIBA KK67 citations96
US5359197AOct 25, 1994
Apparatus and method of aligning electron beam of scanning electron microscope
TOSHIBA KK79 citations96
US5030908AJul 9, 1991
Method of testing semiconductor elements and apparatus for testing the same
TOSHIBA KK51 citations96
US4912052AMar 27, 1990
Method of testing semiconductor elements
TOSHIBA KK85 citations96
US4902131AFeb 20, 1990
Surface inspection method and apparatus therefor
TOSHIBA KK64 citations96
US4807159AFeb 21, 1989
Apparatus and method for controlling irradiation of an electron beam at a fixed position in an electron beam tester system
TOSHIBA KK72 citations96
US6525328B1Feb 25, 2003
Electron beam lithography system and pattern writing method
TOSHIBA KK50 citations93
US6515296B1Feb 4, 2003
Pattern dimension measuring system and pattern dimension measuring method
TOSHIBA KK34 citations93
US5569392AOct 29, 1996
Method and apparatus for repairing defect on plane surface of phase shift mask
TOSHIBA KK29 citations93
US5548183AAug 20, 1996
Magnetic field immersion type electron gun
TOSHIBA KK35 citations93
US5498874AMar 12, 1996
Defect detecting apparatus and method
TOSHIBA KK25 citations93
US5491339AFeb 13, 1996
Charged particle detection device and charged particle radiation apparatus
TOSHIBA KK29 citations93
US5362968ANov 8, 1994
Optic column having particular major/minor axis magnification ratio
TOSHIBA KK33 citations93
US5138169AAug 11, 1992
Method and apparatus for irradiating low-energy electrons
TOSHIBA KK25 citations93
US5029250AJul 2, 1991
Pattern configuration measuring apparatus
TOSHIBA KK27 citations93
US6991878B2Jan 31, 2006
Photomask repair method and apparatus
TOSHIBA KK23 citations92
US6495841B1Dec 17, 2002
Charged beam drawing apparatus
TOSHIBA KK30 citations92
US5444256AAug 22, 1995
Electrostatic lens and method for producing the same
TOSHIBA KK29 citations92
US6414323B1Jul 2, 2002
Charged particle beam apparatus and method of controlling charged particle beam
TOSHIBA KK30 citations91
US7211796B2May 1, 2007
Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor device
TOSHIBA KK6 citations74
US5639308AJun 17, 1997
Plasma apparatus
TOSHIBA KK13 citations74
US5535508AJul 16, 1996
Method for producing an electrostatic lens
TOSHIBA KK8 citations74
US5315119AMay 24, 1994
Electron beam irradiating apparatus and electric signal detecting apparatus
TOSHIBA KK14 citations74
US5293045AMar 8, 1994
Electrostatic lens
TOSHIBA KK13 citations74
US5021702AJun 4, 1991
Electron beam apparatus including a plurality of ion pump blocks
TOSHIBA KK8 citations74
US4800268AJan 24, 1989
Method and apparatus for scanning a laser beam to examine the surface of semiconductor wafer
TOSHIBA KK13 citations74
US7462829B2Dec 9, 2008
Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor device
TOSHIBA KK4 citations63
US5818217AOct 6, 1998
Electron beam irradiating apparatus and electric signal detecting apparatus
TOSHIBA KK3 citations63
US4890029ADec 26, 1989
Electron beam apparatus including plurality of ion pump blocks
TOSHIBA KK5 citations63
US7847250B2Dec 7, 2010
Substrate inspection apparatus, substrate inspection method and method of manufacturing semiconductor device
TOSHIBA KK0 citations52
US6768112B2Jul 27, 2004
Substrate inspection system and method for controlling same
TOSHIBA KK1 citations52
US6410439B1Jun 25, 2002
Semiconductor polishing apparatus and method for chemical/mechanical polishing of films
TOSHIBA KK1 citations52
US6171760B1Jan 9, 2001
Lithographic method utilizing charged particle beam exposure and fluorescent film
TOSHIBA KK1 citations52