Inventor
KATNANI AHMAD D
US30 patents
⚠️ This page may combine multiple inventors who share the name “KATNANI AHMAD D”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
IBM
27 patentsUS6087064AJul 11, 2000
Silsesquioxane polymers, method of synthesis, photoresist composition, and multilayer lithographic method
IBM234 citations99
US6340734B1Jan 22, 2002
Silsesquioxane polymers, method of synthesis, photoresist composition, and multilayer lithographic method
IBM73 citations96
US6210856B1Apr 3, 2001
Resist composition and process of forming a patterned resist layer on a substrate
IBM123 citations96
US6114082ASep 5, 2000
Frequency doubling hybrid photoresist having negative and positive tone components and method of preparing the same
IBM81 citations96
US6043003AMar 28, 2000
E-beam application to mask making using new improved KRS resist system
IBM45 citations96
US6037097AMar 14, 2000
E-beam application to mask making using new improved KRS resist system
IBM50 citations96
US6187505B1Feb 13, 2001
Radiation sensitive silicon-containing resists
IBM46 citations94
US5609989AMar 11, 1997
Acid scavengers for use in chemically amplified photoresists
IBM47 citations94
US6372412B1Apr 16, 2002
Method of producing an integrated circuit chip using frequency doubling hybrid photoresist and apparatus formed thereby
IBM16 citations93
US6313492B1Nov 6, 2001
Integrated circuit chip produced by using frequency doubling hybrid photoresist
IBM22 citations93
US6200726B1Mar 13, 2001
Optimization of space width for hybrid photoresist
IBM33 citations93
US6440635B1Aug 27, 2002
Low “K” factor hybrid photoresist
IBM16 citations92
US6284439B1Sep 4, 2001
Method of producing an integrated circuit chip using low “k” factor hybrid photoresist and apparatus formed thereby
IBM24 citations92
US6103447AAug 15, 2000
Approach to formulating irradiation sensitive positive resists
IBM25 citations92
US5955222ASep 21, 1999
Method of making a rim-type phase-shift mask and mask manufactured thereby
IBM51 citations92
US6344305B1Feb 5, 2002
Radiation sensitive silicon-containing resists
IBM42 citations91
US6245492B1Jun 12, 2001
Photoresist system and process for aerial image enhancement
IBM32 citations91
US6190829B1Feb 20, 2001
Low “K” factor hybrid photoresist
IBM24 citations91
US5296332AMar 22, 1994
Crosslinkable aqueous developable photoresist compositions and method for use thereof
IBM49 citations90
US7856341B2Dec 21, 2010
Heat sink
IBM11 citations82
US5667938ASep 16, 1997
Acid scavengers for use in chemically amplified photoresists
IBM15 citations80
US5733705AMar 31, 1998
Acid Scavengers for use in chemically amplified photoresists
IBM13 citations78
US6372406B1Apr 16, 2002
Deactivated aromatic amines as additives in acid-catalyzed resists
IBM10 citations74
US6140015AOct 31, 2000
Photoresist compositions with pendant polar-functionalized aromatic groups and acid-labile branching
IBM9 citations73
US6268436B1Jul 31, 2001
Approach to formulating irradiation sensitive positive resists
IBM9 citations71
US8030157B1Oct 4, 2011
Liner protection in deep trench etching
IBM4 citations61
US6265134B1Jul 24, 2001
Photoresist compositions with pendant polar-functionalized aromatic groups and acid-labile branching
IBM1 citations52