Inventor

YU GEUN-JONG

KR2 patents

Patents

2 patents

US7604919B2Oct 20, 2009

Monomer, polymer and composition for photoresist

DONGJIN SEMICHEM CO LTD2 citations60

US7569325B2Aug 4, 2009

Monomer having sulfonyl group, polymer thereof and photoresist composition including the same

DONGJIN SEMICHEM CO LTD3 citations60