Inventor

YEH TSE-AN

TW2 patents

Patents

2 patents

US12078921B2Sep 3, 2024

Phase-shift reticle for use in photolithography

ENTEGRIS INC0 citations58

US12449728B2Oct 21, 2025

High quantum efficiency dry resist for low exposure dose of EUV radiation

ENTEGRIS INC0 citations56