Inventor

GREELEY J NEIL

US11 patents

⚠️ This page may combine multiple inventors who share the name “GREELEY J NEIL”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

MICRON TECHNOLOGY INC

5 patents

US9276059B2Mar 1, 2016

Semiconductor device structures including metal oxide structures

MICRON TECHNOLOGY INC5 citations84

US10090376B2Oct 2, 2018

Methods of forming semiconductor device structures, and methods of forming capacitor structures

MICRON TECHNOLOGY INC3 citations72

US9768021B2Sep 19, 2017

Methods of forming semiconductor device structures including metal oxide structures

MICRON TECHNOLOGY INC0 citations52

US10629671B2Apr 21, 2020

Methods of forming semiconductor device structures, and methods of forming capacitor structures

MICRON TECHNOLOGY INC0 citations51

US9175217B2Nov 3, 2015

Wet etchants including at least one fluorosurfactant etch blocker

MICRON TECHNOLOGY INC0 citations51

KIEHLBAUCH MARK W

2 patents

US8252194B2Aug 28, 2012

Methods of removing silicon oxide

KIEHLBAUCH MARK W156 citations97

US9005473B2Apr 14, 2015

Gaseous compositions comprising hydrogen fluoride and an alkylated ammonia derivative

KIEHLBAUCH MARK W2 citations61

MILLWARD DAN B

2 patents

US8097175B2Jan 17, 2012

Method for selectively permeating a self-assembled block copolymer, method for forming metal oxide structures, method for forming a metal oxide pattern, and method for patterning a semiconductor structure

MILLWARD DAN B43 citations97

US8669645B2Mar 11, 2014

Semiconductor structures including polymer material permeated with metal oxide

MILLWARD DAN B16 citations92

SINHA NISHANT

2 patents

US8153019B2Apr 10, 2012

Methods for substantially equalizing rates at which material is removed over an area of a structure or film that includes recesses or crevices

SINHA NISHANT1 citations62

US8729002B2May 20, 2014

Wet etchants including at least one etch blocker

SINHA NISHANT0 citations51