P

Inventor

ZHU ZHENGMAO

US16 patents
⚠️ This page may combine multiple inventors who share the name “ZHU ZHENGMAO”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.

IBM

4 patents
US8035141B2Oct 11, 2011

Bi-layer nFET embedded stressor element and integration to enhance drive current

IBM15 citations84
US9385237B2Jul 5, 2016

Source and drain doping profile control employing carbon-doped semiconductor material

IBM0 citations52
US9231108B2Jan 5, 2016

Source and drain doping profile control employing carbon-doped semiconductor material

IBM0 citations52
US8378424B2Feb 19, 2013

Semiconductor structure having test and transistor structures

IBM1 citations52

CHAN KEVIN K

3 patents
US8299535B2Oct 30, 2012

Delta monolayer dopants epitaxy for embedded source/drain silicide

CHAN KEVIN K9 citations84
US8236660B2Aug 7, 2012

Monolayer dopant embedded stressor for advanced CMOS

CHAN KEVIN K2 citations62
US8421191B2Apr 16, 2013

Monolayer dopant embedded stressor for advanced CMOS

CHAN KEVIN K0 citations51

HUMMINGBIRDEV

2 patents
US10836273B2Nov 17, 2020

Adaptive electric vehicle charging based on grid monitoring

HUMMINGBIRDEV14 citations83
US10836275B2Nov 17, 2020

Adaptive electric vehicle charging based on grid monitoring

HUMMINGBIRDEV10 citations81

ZHEJIANG HANMINGBO NEW ENERGY CO LTD

2 patents
US12214684B2Feb 4, 2025

System and method for charging electric vehicles

ZHEJIANG HANMINGBO NEW ENERGY CO LTD2 citations69
US12233729B1Feb 25, 2025

System and method for adjusting voltage and/or current while charging electric apparatuses

ZHEJIANG HANMINGBO NEW ENERGY CO LTD0 citations47

BERLINER NATHANIEL C

1 patent
US8900973B2Dec 2, 2014

Method to enable compressively strained pFET channel in a FinFET structure by implant and thermal diffusion

BERLINER NATHANIEL C14 citations81

ONTALUS VIOREL

1 patent
US9059292B2Jun 16, 2015

Source and drain doping profile control employing carbon-doped semiconductor material

ONTALUS VIOREL8 citations79

DUBE ABHISHEK

1 patent
US8338279B2Dec 25, 2012

Reduced pattern loading for doped epitaxial process and semiconductor structure

DUBE ABHISHEK3 citations62

COLLEGE WILLIAM & MARY

1 patent
US7585550B2Sep 8, 2009

Process for modifying polymeric surfaces using deep UV irradiation

COLLEGE WILLIAM & MARY2 citations62

ADAM LAHIR

1 patent
US8535999B2Sep 17, 2013

Stress memorization process improvement for improved technology performance

ADAM LAHIR2 citations52