Inventor
UEDA ISSEI
JP50 patents
⚠️ This page may combine multiple inventors who share the name “UEDA ISSEI”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
TOKYO ELECTRON LTD
43 patentsUS6074154AJun 13, 2000
Substrate treatment system, substrate transfer system, and substrate transfer method
TOKYO ELECTRON LTD457 citations99
US5826129AOct 20, 1998
Substrate processing system
TOKYO ELECTRON LTD552 citations99
US6656281B1Dec 2, 2003
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD518 citations98
US6439822B1Aug 27, 2002
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD540 citations98
US5711646AJan 27, 1998
Substrate transfer apparatus
TOKYO ELECTRON LTD128 citations98
US6672779B2Jan 6, 2004
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD51 citations96
US6471422B2Oct 29, 2002
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD63 citations96
US6444029B1Sep 3, 2002
Multistage spin type substrate processing system
TOKYO ELECTRON LTD57 citations96
US6425722B1Jul 30, 2002
Substrate treatment system, substrate transfer system, and substrate transfer method
TOKYO ELECTRON LTD54 citations96
US6402401B1Jun 11, 2002
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD49 citations96
US6402400B1Jun 11, 2002
Substrate processing apparatus
TOKYO ELECTRON LTD60 citations96
US7281869B2Oct 16, 2007
Coating and developing system and coating and developing method
TOKYO ELECTRON LTD30 citations93
US7267497B2Sep 11, 2007
Coating and developing system and coating and developing method
TOKYO ELECTRON LTD29 citations93
US7241061B2Jul 10, 2007
Coating and developing system and coating and developing method
TOKYO ELECTRON LTD34 citations93
US6919913B1Jul 19, 2005
Processing system
TOKYO ELECTRON LTD21 citations93
US6726771B2Apr 27, 2004
Treatment solution supply method and treatment solution supply unit
TOKYO ELECTRON LTD24 citations93
US6426303B1Jul 30, 2002
Processing system
TOKYO ELECTRON LTD30 citations93
US6399518B1Jun 4, 2002
Resist coating and developing processing apparatus
TOKYO ELECTRON LTD26 citations93
US6379056B1Apr 30, 2002
Substrate processing apparatus
TOKYO ELECTRON LTD40 citations93
US6341903B1Jan 29, 2002
Substrate processing apparatus
TOKYO ELECTRON LTD25 citations93
US6340643B2Jan 22, 2002
Treatment solution supply method
TOKYO ELECTRON LTD35 citations93
US6338582B1Jan 15, 2002
Substrate delivery apparatus and coating and developing processing system
TOKYO ELECTRON LTD28 citations93
US6293713B1Sep 25, 2001
Substrate processing apparatus
TOKYO ELECTRON LTD34 citations93
US6290405B1Sep 18, 2001
Substrate processing apparatus
TOKYO ELECTRON LTD34 citations93
US6161969ADec 19, 2000
Apparatus for processing a substrate
TOKYO ELECTRON LTD44 citations93
US6318948B1Nov 20, 2001
Substrate transfer apparatus and substrate processing apparatus
TOKYO ELECTRON LTD26 citations92
US6319322B1Nov 20, 2001
Substrate processing apparatus
TOKYO ELECTRON LTD34 citations92
US6309116B1Oct 30, 2001
Substrate processing system
TOKYO ELECTRON LTD26 citations92
US6332724B1Dec 25, 2001
Substrate processing apparatus
TOKYO ELECTRON LTD24 citations90
US7245348B2Jul 17, 2007
Coating and developing system and coating and developing method with antireflection film and an auxiliary block for inspection and cleaning
TOKYO ELECTRON LTD18 citations84
US6746197B2Jun 8, 2004
Substrate processing apparatus and substrate processing method
TOKYO ELECTRON LTD14 citations84
US6655891B2Dec 2, 2003
Substrate treatment system, substrate transfer system, and substrate transfer method
TOKYO ELECTRON LTD13 citations84
US6402508B2Jun 11, 2002
Heat and cooling treatment apparatus and substrate processing system
TOKYO ELECTRON LTD19 citations84
US6264381B1Jul 24, 2001
Process system
TOKYO ELECTRON LTD17 citations84
US6432204B1Aug 13, 2002
Temperature and humidity controlled processing system
TOKYO ELECTRON LTD7 citations74
US6405094B1Jun 11, 2002
Apparatus and method of collecting substrates abnormally processed or processed previous to ordinary processing
TOKYO ELECTRON LTD9 citations74
US6299363B1Oct 9, 2001
Substrate processing apparatus
TOKYO ELECTRON LTD11 citations74
US6264705B1Jul 24, 2001
Processing system
TOKYO ELECTRON LTD6 citations74
US6126703AOct 3, 2000
Substrate processing apparatus having an interface section including two stacked substrate waiting table
TOKYO ELECTRON LTD13 citations74
US9373531B2Jun 21, 2016
Substrate transfer device, substrate processing apparatus, and substrate accommodation method
TOKYO ELECTRON LTD3 citations73
US7793609B2Sep 14, 2010
Coating and developing apparatus
TOKYO ELECTRON LTD5 citations63
US6197372B1Mar 6, 2001
Coating and developing apparatus, complex apparatus and processing method in coating and developing apparatus
TOKYO ELECTRON LTD2 citations63
US9666463B2May 30, 2017
Substrate processing apparatus
TOKYO ELECTRON LTD1 citations52