Inventor
ZHANG JINGCHUN
US36 patents
⚠️ This page may combine multiple inventors who share the name “ZHANG JINGCHUN”. Patents are grouped by organization below to help distinguish them — per-person disambiguation is on the roadmap.
APPLIED MATERIALS INC
27 patentsUS9842744B2Dec 12, 2017
Methods for etch of SiN films
APPLIED MATERIALS INC113 citations99
US9449845B2Sep 20, 2016
Selective titanium nitride etching
APPLIED MATERIALS INC138 citations99
US9437451B2Sep 6, 2016
Radical-component oxide etch
APPLIED MATERIALS INC134 citations99
US9418858B2Aug 16, 2016
Selective etch of silicon by way of metastable hydrogen termination
APPLIED MATERIALS INC138 citations99
US9343327B2May 17, 2016
Methods for etch of sin films
APPLIED MATERIALS INC147 citations99
US9236266B2Jan 12, 2016
Dry-etch for silicon-and-carbon-containing films
APPLIED MATERIALS INC153 citations99
US9093390B2Jul 28, 2015
Conformal oxide dry etch
APPLIED MATERIALS INC185 citations99
US9023734B2May 5, 2015
Radical-component oxide etch
APPLIED MATERIALS INC182 citations99
US8921234B2Dec 30, 2014
Selective titanium nitride etching
APPLIED MATERIALS INC187 citations99
US8801952B1Aug 12, 2014
Conformal oxide dry etch
APPLIED MATERIALS INC191 citations99
US8765574B2Jul 1, 2014
Dry etch process
APPLIED MATERIALS INC182 citations99
US8642481B2Feb 4, 2014
Dry-etch for silicon-and-nitrogen-containing films
APPLIED MATERIALS INC188 citations99
US10062578B2Aug 28, 2018
Methods for etch of metal and metal-oxide films
APPLIED MATERIALS INC94 citations98
US9754800B2Sep 5, 2017
Selective etch for silicon films
APPLIED MATERIALS INC110 citations98
US9576809B2Feb 21, 2017
Etch suppression with germanium
APPLIED MATERIALS INC131 citations98
US9472412B2Oct 18, 2016
Procedure for etch rate consistency
APPLIED MATERIALS INC132 citations98
US9390937B2Jul 12, 2016
Silicon-carbon-nitride selective etch
APPLIED MATERIALS INC132 citations98
US9245762B2Jan 26, 2016
Procedure for etch rate consistency
APPLIED MATERIALS INC165 citations98
US9034770B2May 19, 2015
Differential silicon oxide etch
APPLIED MATERIALS INC181 citations98
US9887096B2Feb 6, 2018
Differential silicon oxide etch
APPLIED MATERIALS INC113 citations97
US9881805B2Jan 30, 2018
Silicon selective removal
APPLIED MATERIALS INC110 citations97
US9564338B1Feb 7, 2017
Silicon-selective removal
APPLIED MATERIALS INC124 citations97
US11637002B2Apr 25, 2023
Methods and systems to enhance process uniformity
APPLIED MATERIALS INC4 citations74
US10892198B2Jan 12, 2021
Systems and methods for improved performance in semiconductor processing
APPLIED MATERIALS INC4 citations66
US8541312B2Sep 24, 2013
Selective suppression of dry-etch rate of materials containing both silicon and nitrogen
APPLIED MATERIALS INC3 citations63
US11239061B2Feb 1, 2022
Methods and systems to enhance process uniformity
APPLIED MATERIALS INC0 citations62
US10026597B2Jul 17, 2018
Hydrogen plasma based cleaning process for etch hardware
APPLIED MATERIALS INC1 citations49
ZHANG JINGCHUN
5 patentsUS9324576B2Apr 26, 2016
Selective etch for silicon films
ZHANG JINGCHUN152 citations99
US9064815B2Jun 23, 2015
Methods for etch of metal and metal-oxide films
ZHANG JINGCHUN564 citations99
US8999856B2Apr 7, 2015
Methods for etch of sin films
ZHANG JINGCHUN187 citations99
US8771539B2Jul 8, 2014
Remotely-excited fluorine and water vapor etch
ZHANG JINGCHUN185 citations99
US8771536B2Jul 8, 2014
Dry-etch for silicon-and-carbon-containing films
ZHANG JINGCHUN185 citations98